Gasonics L3510E

Brand: GaSonics
Model: L3510
Single Wafer Ashing System

Used
Details:
A versatile downstream photoresist removal system
designed for clean
damage-free removal
of the most difficult resist structures
Utilizing the production-proven
L-Series platform, the L3510
has a wide process window
due to its patented microwave plasma source
Programmable heating
and process controls contribute
to the system's unparalleled process flexibility
Enhanced reliability, serviceability,
and performance
Proven platform (L-platform)
Platen and lamp heating for process flexibility
Reliable endpoint detection
Small footprint, low cost of ownership
System performance matching
Option SMIF Indexer
AGV and robotic cassette loading
Stand-alone or flish mount installation
Specifications:
Gas Flows: O2 = 1000 - 4000
sccm; N2/H2 = 100 - 1000
sccm; N2 = 100 - 500 sccm
Pressure: 0.5 - >5.0 torr
Platen temperature: 100 - 300°C
µwave Power: 0 - 1200 watts
at 2.45 GHz/water cooled
Lamp utilization: 0 - 100% (1000 watts)
Throughput: 1.2µm softbaked