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Kulicke & Soffa

Ref : 1891678-9-MT
Condition : Used
Manufacturer : Kulicke & Soffa
Model : -
Year(s) : -
Quantity : 0
Location : Seller or machines location:
AMERICA North (USA-Canada-Mexico)
Last check : 22 Mar. 2019

K&S 973 High Pressure Microwash Substrate Cleaning Systems

For sawed/scribed wafers or photomask cleaning. Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration. Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation. CO2 reionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp. 115V, 50/60 Hz, 6A.