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Used Plasma Etcher / Asher

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1

Alcalic etch line, left to right, line length 5.310mm, modules input 770mm, fine line etcher 1.130mm, interm s Year(s) : 2015 Location : EUROPE (Western and Northern)

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- Shelves, controller, and internal MFCs - RF Generator - Removable Shelves - Vacuum Pump Excellent Conditio Location : AMERICA North (USA-Canada-Mexico)

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1

Micro etch preclean line, modules; input, degreasing, rinse, micro etch, acid rinse, dryer, output. Line lengt Year(s) : 2015 Location : EUROPE (Western and Northern)

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1

Feric Chloride etch line and stripper, max panel width 1320mm, min/max panel thickness 0.3/2.0mm, work directi Year(s) : 2014 Location : EUROPE (Western and Northern)

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7

Etching system, manufacturer: TEL EPION, model: Ultratrimmer 30, year of construction: 2015, weight: 2,648 kg, Year(s) : 2015 Location : ASIA (China - Taiwan - HKG)

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chamber dimensions 16 x16"x18" 2 Porter MFC's ENI ACG-3B 600w 13.56mhz Rf power supply Leybold D65BCS vacuum p Location : AMERICA North (USA-Canada-Mexico)

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Vacuum chamber 340 x 400 x 450mm Door with auto unlock feature after end of process Microwave excitation 2.45G Location : AMERICA North (USA-Canada-Mexico)

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ENI ACG10B 1200W Rf 13.56mhz generator 2 powered shelves Porter Masss flow controllers: 1000 SCCM N2 500 SCCM Location : AMERICA North (USA-Canada-Mexico)

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Reactive Ion Etch System Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)

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PM 119 RF GENERATOR (500 WATTS) 10″ DIAM X 20″DEEP QUARTZ CHAMBER 3 GAS CAPABLILITY INCLUDES FOMBLIN PREPPED D Location : AMERICA North (USA-Canada-Mexico)

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750 WATT GENERATOR, 3 GAS CAPABILITY 10X20″ QUARTZ BARREL INCLUDES FOMBLIN PREPPED DIRECT DRIVE VACUUM PUMP DO Location : AMERICA North (USA-Canada-Mexico)

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TABLE TOP REACTIVE ION ETCHER ONE WAFER UP TO 6″ DIAMETER PER CYCLE TURBO PUMPED MICROPROCESSOR CONTROLLED REB Location : AMERICA North (USA-Canada-Mexico)

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Model F-REX300 300 mm Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 200 mm Number of Chambers 1 Process Capabil Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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Polysilicon Dry Etch Chamber Version: 300 MM Vintage: 01.06.2012 TEL Tactras RLSA Etch Chamber TactrasTM RL Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)

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Version: 200 MM Vintage: 01.06.2013 Deinstalled in October 2021, warehoused. Can be inspected by appointment Year(s) : 2013 Location : AMERICA North (USA-Canada-Mexico)

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Manufacturer: TES Plasma-Enhanced CVD system Version: 300 mm Vintage: 01.05.2010 De-installed, warehoused. Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)

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XeF2 Etching System Version: Inquire Vintage: 01.06.2018 Year(s) : 2018 Location : AMERICA North (USA-Canada-Mexico)

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-Reaction Chamber Item CC1012-00100 s/n 10206 -RF Delivery Item CR1044-00201 s/n 10593 -Matching Network Item Year(s) : 1984 Location : AMERICA North (USA-Canada-Mexico)

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-Set up for load and unload of 4 inch wafers, cassette to cassette. -Sold Strictly "as is, where is", with con Year(s) : 1985 Location : AMERICA North (USA-Canada-Mexico)

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Dielectric Etch Version: 300 mm Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)

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Spin Etcher Version: 300 mm Location : AMERICA North (USA-Canada-Mexico)

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Plasma Dry etcher Version: 200 mm Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)

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Poly Etcher Version: 300 mm Year(s) : 2016 Location : AMERICA North (USA-Canada-Mexico)

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AE Poly G3 dry etcher Version: 300 mm Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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