Trion Sirus T2
United States (USA)
Tabletop RIE Reactive Ion Etcher. Plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. Processes have been developed for etching silicon, silicon dioxide, silicon nitride, quartz, polyimide, tantalum, tungsten and other materials. Small footprint and robust design make it ideal for the lab environment. Good profile control, high sensitivity and good uniformity. 200mm bottom electrode. PC interface with touchscreen. Four MFC gas inputs, previous gases used AR, SF6, O2, CF4. Automatic tuning with 13.56 MHz 600W RF generator. Automatic pressure control package. Includes recirculating chiller. Turbo pump and roughing pump included. Endpoint detection in photo can be added at additional price. Year of Mfg.: 2011. Very Nice Condition.