Ultratech 1500, Big Field
AMERICA North (USA-Canada-Mexico)
Brand: Ultratech
Model: 1500, Big Field
An electronic focus system which permits more accuracte
and repeatable substrate positioning in the focal plane
Used
Details:
allowing the system to print 0.1um and 0.8um
resolution geometry in a production mode
System capable of wafers: 3", 4", 5", 6", or 8"
Exposes reticule images in a step-and-repeat manner
Large exposure field, permitting large die exposure
Electronic target detectors allow simultaneous
independent left and right target scans
944 servo boards provide more stability during movement and exposure
Auto pre-alignment
Cassette to cassette load
Specifications:
System set up for 4" wafers and 0.8 micron lens
Fine line resolution (0.1um standard
and 0.8um optional) and tight overlay accuracy
XY stage, air breaing, laser metered, resolution of .00004mm
Throughput: 55 WPH (1.0um lens), 45 WPH (0.8um lens)
Uniformity: 2.5%
Depth of focus: 3.0 uns @ 1.0um lines
Maximum square: 18 x 18mm
Maximum aspect: 39 x 11.4mm
Maximum area: 34.2 x 13.6mm
Reticle size: 3" x 5" x 0.090"