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Used CVD Equipment

195 results
1

Vacuum System None Vacuum System Chamber made up of the 8" CF 4-way cross, M/N: 600-4T, 304SS 8" CF Door/V Location : AMERICA North (USA-Canada-Mexico)

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Description In-Line Sputtering System Vacuum System Diffusion Pumped Load Lock Included Yes Power Requireme Location : AMERICA North (USA-Canada-Mexico)

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Thin Flim Deposition Controller Other Information System Components: Control unit: P/N 753-003-G1 Sensor cont Location : AMERICA North (USA-Canada-Mexico)

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Description Gen 5 PEVCD Chamber - New Accessories Substrate Size: 1200 mm x 1300 mm Location : AMERICA North (USA-Canada-Mexico)

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Gen 6 PEVCD Chamber - Accessories Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: Location : AMERICA North (USA-Canada-Mexico)

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4x Standard SNIT Chambers Year(s) : 1993 Location : EUROPE (Western and Northern)

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P5000 CVD Condition Very Good Serial Number(s) 4558 Year(s) : 1995 Location : EUROPE (Western and Northern)

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Wafer Size Range Minimum 150 mm Maximum 150 mm Set Size 150 mm Number of Chambers 4 Condition Ver Year(s) : 2000 Location : EUROPE (Western and Northern)

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Wafer Size 6 Location : ASIA (North East)

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Wafer Size 8 Location : ASIA (North East)

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Deposition tool P500049 4 Chambers 2 Chambers Etch, 2 Chambers CVD Teos Year(s) : 2000 Location : ASIA (North East)

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Chamber : 3 units Mark II Univesal Chambers Year(s) : 1993 Location : ASIA (North East)

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Process Chamber : 3 units Mark II Univesal Chambers Year(s) : 1995 Location : ASIA (North East)

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Process Chamber : 3 units Mark II Univesal Chambers Year(s) : 1996 Location : ASIA (North East)

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Standard Mainframe with 2 Argon Sputter Chambers Year(s) : 2000 Location : ASIA (North East)

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VDS-5500 Description P-CVD Year(s) : 1988 Location : ASIA (North East)

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Centura WCVD Location : ASIA (North East)

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VCF-610 Description LP-CVD HTO Year(s) : 1994 Location : ASIA (North East)

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AEC2250 Description AP-CVD(VAPOX) Year(s) : 1985 Location : ASIA (North East)

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Description AP-CVD(AMAX) Location : ASIA (North East)

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Eagle-10 Description P-CVD(E-10) Year(s) : 1994 Location : ASIA (North East)

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MOCVD #5 / LED Year(s) : 2003 Location : ASIA (North East)

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PXJ-200 Year(s) : 1989 Location : ASIA (North East)

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LPCVD / LED Year(s) : 2008 Location : ASIA (North East)

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150/200mm track Year(s) : 2001 Location : ASIA (North East)

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You can find used  CVD Equipment on Wotol

The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson

The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG

HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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