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Used CVD Equipment

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TISI ID 150910-23 Manufacturer TEL Model α-808SC Description LP-CVD(Nitride) Wafer Size 200mm Location : ASIA (North East)

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Metal Wafer Size 12" Year(s) : 2001 Location : ASIA (North East)

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P-CVD(E-10) Year(s) : 1999 Location : ASIA (North East)

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Vertical LPCVD Furnace Location : ASIA (North East)

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Nitride, DxL, / 4C/H Wafer Size 8" Year(s) : 1998 Location : ASIA (North East)

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Sputtering device Year(s) : 2009 Location : ASIA (North East)

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Sputtering system wth load lock Location : ASIA (North East)

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DxL / 4C/H Wafer Size 8" Location : ASIA (North East)

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TEOS / 2C/H Wafer Size 8" Location : ASIA (North East)

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TEOS / 3C/H Wafer Size 6" Location : ASIA (North East)

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CVD DxL Nitride / 4C/H Location : ASIA (North East)

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MOCVD Year(s) : 2008 Location : ASIA (North East)

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Nitride Wafer Size 8" Year(s) : 1991 Location : ASIA (North East)

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DxL / 2Ch Wafer Size 6" Year(s) : 1995 Location : ASIA (North East)

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CVD Ti&CVD TIN Wafer Size 200mm Location : ASIA (North East)

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Delta Teos / 3Ch Wafer Size 6" Year(s) : 1995 Location : ASIA (North East)

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Delta TEOS DxL / 3C/H Wafer Size 8" Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)

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Brand: JPEL P-CVD Lead Time Immediately Year(s) : 1999 Location : ASIA (North East)

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DxL Wafer Size 8" Location : ASIA (North East)

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Cassette to Cassette YES Accessories We sell the whole tool. CE Marked YES Condition Very Good Serial Num Year(s) : 2001 Location : EUROPE (Western and Northern)

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PVD:Evaporator Year(s) : 2018 Location : ASIA (North East)

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PVD:Sputter/6in Location : ASIA (North East)

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CVD: MOCVD/2in. Year(s) : 2007 Location : ASIA (North East)

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CVD:MOCVD/4in Location : ASIA (North East)

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CVD:APCVD/6in Location : ASIA (North East)

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You can find used  CVD Equipment on Wotol

The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson

The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG

HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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