Used Wafer Equipment
384 resultsSerial Number: AK200176 Wafer Size: 200mm MicroTec Delta 20T2 Manual Coat Spinner with Delta 150 VPO Hot plate Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMicroscope: Quick Vision System Location : ASIA (North East)
Price : On request
More details961 Wafer Mounting Station enables the mounting of wafers up to 8 inches in diameter. This mounting station is Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMicroscope Location : ASIA (North East)
Price : On request
More detailsMicroscope Location : ASIA (North East)
Price : On request
More detailsAligner/5in. Location : ASIA (North East)
Price : On request
More detailsXynetics-Electroglas 1034 XA - 6 Automatic Wafer Prober (171) , 6" XY-table, 6" chuck Location : EUROPE (Western and Northern)
Price : On request
More detailsKarl Suss MJB 21 Mask Aligner (118) , Basic machine up to 3" Si wafer, 2" in our configuration Location : EUROPE (Western and Northern)
Price : On request
More detailsAligner Location : ASIA (North East)
Price : On request
More detailsConfiguration: KLA-Tencor 8100XP CD-SEM is an advanced metrology instrument with capability to provide super Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAligner: Mask Year(s) : 2002 Location : ASIA (North East)
Price : On request
More detailsCoat/Develop Cluster Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPatterned Wafer Surface Inspection Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPerformance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Therm Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPerformance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Therm Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMikroskop 220 V ~ / 50 - 60 Hz / 20 VA B (width) m / T (depth) m H (height) m / G (weight) kg Yes) good Location : EUROPE (Western and Northern)
Price : On request
More detailsOther: Autocollimator Location : ASIA (North East)
Price : On request
More detailsMM-60 Location : EUROPE (Western and Northern)
Price : On request
More detailsKarl Suss MJB 55 Aligners (MJB 55) Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsQuintel 4" Aligner * Sized for 4" wafers. Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPerkin Elmer 341 Mask Aligners (341) Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPerkin Elmer 340 Mask Aligners (340) Inventory Number: 60 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPerkin Elmer 300 Capable of 3" to 5" wafers. 80 wafers per hour throughput. Enhanced high performance conden Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsKarl Suss MJB-3 Aligners (MJB-3 mask Aligner) - 3" dia. or partial wafers. - Single Field Microscope. - NPL Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsKarl Suss MA 8 Mask Aligner (Kalr Suss MA 8) Inventory Number: 51723 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices