Used Semiconductor Equipment

Description OmniMap AutoRS75/tc Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 mm Year(s) : 1996 Location : EUROPE (Western and Northern)

Price : On request

【specification】 Monitor Color LCD (IPS type) 23-inch 3D display function available Photographing device (CCD) Location : ASIA (North East)

Price : On request

【specification】 Type Measurement objective lens Minimum measurement display 0.1μm/0.5μm/1μm (switchable) Meas Location : ASIA (North East)

Price : On request

【specification】 ・Secondary electron image resolution: 3.0nm (acceleration voltage 30kV, high vacuum mode) 10n Location : ASIA (North East)

Price : On request

Condition Fair Weight 220 lb (100 kg) Exterior Dimensions Width 17.717 in (45.0 cm) Depth 21.654 Year(s) : 1997 Location : EUROPE (Western and Northern)

Price : On request

Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 mm Condition Good CD Overlay Measureme Year(s) : 2001 Location : EUROPE (Western and Northern)

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This furnace can handle wafers up to 150mm Configuration: N2 - 1500 l/min N2 - 660 l/min Forming Gas 660l Year(s) : 1994 Location : EUROPE (Western and Northern)

Price : On request

Manufacturer TEXUS CO., LTD. Condition Good Exterior Dimensions Width 86.614 in (220.0 cm) Depth 4 Year(s) : 2015 Location : EUROPE (Western and Northern)

Price : On request

SHODA MVC-630BII Location : EUROPE (Western and Northern)

Price : On request

Disk Inspection Microscope/Motorized Stage Microscope Type Upright Microscope Configuration Brightfield, DIC Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Microscope Configuration Brightfield & Darkfield Illumination Type Reflected Light Binocular Angle Variable Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Microscope Configuration Brightfield, Darkfield & DIC Illumination Type Hg Reflected Light Binocular Angle Location : AMERICA North (USA-Canada-Mexico)

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CVD: APCVD/6in Location : ASIA (North East)

Price : On request

Ion implanter Model E220 Year(s) : 1995 Location : ASIA (North East)

Price : On request

Wet Oxide Etcher Location : ASIA (North East)

Price : On request

Lithography Coater and Developer Version: 300 mm Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Metal film measurement system Version: 150-200 mm Vintage: 01.06.2006 The equipment has been professionally de Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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Refurbished condition Sold in good working condition Year(s) : 2000 Location : EUROPE (Western and Northern)

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Main Axis is not operational. Year(s) : 1999 Location : EUROPE (Western and Northern)

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Wafer size: 8" Condition: as is - Load/Unload: Dual SMIF Arm with Wafer Transfer System (LRL process flow) - M Year(s) : 2001 Location : EUROPE (Western and Northern)

Price : On request

Spectroscopic ellipsometry: Measures the change in polarization state of light reflected from a sample to de Location : AMERICA North (USA-Canada-Mexico)

Price : On request

The Model DE3496 provides particle concentrations per in.2 or cm2 in five sizes from 0.3 µm to 10 µm. It mea Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Bare Wafer Surface Defect Inspection System Max Wafer Capable: 8”/200mm System configured for 8“/200mm wafers Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Horizontal spin axis, for up to 6″ wafers Location : AMERICA North (USA-Canada-Mexico)

Price : On request

20 HEAVY WIRE BONDER FOR 10-20 MIL WIRE INCLUDES CALIBRATED STEREO ZOOM OPTICS (ADD $740 FOR DEEP ACCESS CLAMP Location : AMERICA North (USA-Canada-Mexico)

Price : On request