E.A. Fischione Instruments 1020 plasma cleaner
AMERICA North (USA-Canada-Mexico)
Simultaneously cleans transmission and scanning electron microscope specimens
and specimen holders
Enhances imaging and analytical results
Removes existing carbonaceous contamination
Prevents contamination
No etching or sputtering
Storage in clean vacuum
Simultaneously cleans electron microscopy specimens and holders
Plasma Cleaner automatically and quickly removes organic contamination
(hydrocarbon) from electron microscopy specimens and specimen holders.
A low energy, reactive gas plasma cleans without changing the
specimen’s elemental composition or structural characteristics.
The Plasma Cleaner features easy-to-use front panel controls and
an oil-free vacuum system for optimal processing.
Enhanced imaging and analysis
Cleaning is solely by reactive gas compounds formed by the
plasma chemically reacting with carbonaceous material on
the specimen and specimen holder.
The nonequilibrium, high-frequency plasma is generated with
a gas mixture of 25% oxygen and 75% argon.
Free electrons are accelerated to high velocities by
an oscillating electromagnetic field (13.56 MHz)
that excites gas atoms and creates the plasma.
The plasma ions impinge upon the surface with
energies of less than 12 eV, which is below the specimen’s
sputtering threshold.
In electron microscopes with high brightness electron sources, specimens that
are not plasma treated tend to contaminate. The Plasma Cleaner
ensures confidence that carbonaceous contamination will not interfere
with imaging or analysis, even during fine probe microanalysis
for extended periods.
Standard and specialized specimen holders
The Plasma Cleaner readily accepts side-entry specimen holders for
all commercial transmission electron microscopes, as well as scanning
electron microscope samples and a wide variety of bulk materials.
A specialized specimen holder port allows the cleaning of
specimens contained on carbon grids.
FISCHIONE 1020 PLASMA CLEANER SEM/ TEM/ STEM
Product Specifics
Plasma System
High frequency (13.56 MHz) oscillating field system coupled to
a quartz and stainless steel plasma chamber
Ion energies less than 12 eV
Compatible with TEM specimen holders for
transmission electron microscopes manufactured by:
- FEI Company/Philips Electron Optics
- Hitachi High Technologies America Inc.
- JEOL Ltd.
- Carl Zeiss Microscopy/LEO Electron Microscopes
- Topcon Corp.
Vacuum system
Oil-free turbomolecular drag pump and a multistage diaphragm pump
Ultimate vacuum of 1 x 10-7 mbar
Gas
25% oxygen and 75% argon
Nominal 10 psi (200 kPa) delivery pressure
Flow rate is factory set and can be adjusted via a potentiometer located
on the service panel