Ontrak DSS-200

DSS-200 CMP Double Sided Brush Cleaner. Double sided wafer cleaner for post CMP cleaning. The DSS-200 scrubs, rinses and dries 4”, 6” or 8” (100, 150 or 200mm) wafers. System is currently configured for 6" by 6" squares. Parts needed to change sizes. Consists of system electronics, a send indexer, a brush cleaning station, spin station and robotic edge handling receive indexer. Wafers are DI sprayed while in sender, moved to brush stations where they are cleaned by top and bottom brushes with DI and/or cleaning chemistry. In spinning station they are DI rinsed and dried. CE marking.