Applied Materials 9500xR, Current Ion Implanter

Brand: Applied Materials
Model: 9500xR
CURRENT ION IMPLANTER

Specifications
• Used
• Bernas Source
• Indirectly Heated Cathode (IHC)
• 12-bit scan clock
• Low dose kit
• SDS Gas box
• Internal Ar gas connection
• Solid source vaporizers
• Leihold pumps
• Edwards beams line pump
• Dual bellows extraction assembly
• Capable of 150mm wafers.
• Wafer tilt: 0 - 7 deg.
• Working substance: B+, As+, P+, Sb+, BF2+
• Implantation energy max 200 KeV
• Extraction voltage max 60 KeV
• Acceleration voltage 0....160 KeV
• Uniformity: 0.5%
• Repeatability: 1%
• Introduced defectiveness:
• particle size > 0.16 micron - 0.13 particle/cm2
• particle size > 0.3 - 0.5 particle/cm2
• Possibility of wafer's turn on 1800 at doping

Capacity
• B E = 30 D = 5el5: 80 wafers/hour
• P E = 60 D = 5el5: 140 wafers/hour
• Stability of Ionic source radiation 10%