Brewer Science CEE 4000

• Wafer Size Minimum: 100 mm
• Wafer Size Maximum: 200 mm
• Cassette Elevators: 2
• Photoresist Coat Stations: 1
• Photoresist Dispenses: 5
• Hot Plates: 1
• Substrate Compatibility: up to 200 mm round
• Substrate Compatibility: up to 6 inch square
• Spin Speed Range: 0–6000 rpm
• Acceleration Range: 1–30,000 rpm/sec (unloaded)
• Hot Chuck Size: 10 × 10 inch
• Temperature Range: 50–300 °C
• Temperature Control: programmable digital PID
• Power Requirement: 120 / 220 V, 50/60 Hz, single phase
• Operating Air Pressure: 70 PSI
• Vacuum Requirement: 25 in Hg
• External Width: 36 inch
• External Depth: 41 inch
• External Height: 18 inch
• Weight: 380 lb