KLA-Tencor RS100 Resistivity Mapping System

Brand: KLA-Tencor
Model: RS100

Used
Details:
With the ability to measure materials such as
polysilicon, copper, and bulk silicon substrates.
System capable of running 200mm and 300mm wafers

Specifications:
System capable of running 200mm
and 300mm wafers
Applications range from metal depostion
CMP, ion implantation, and diffusion
High-resolution such as 49,100 or 625 point maps
Modular handler flexibility choose
from a variety of automated handler configurations
Open cassette for 200mm to 300mm wafers
FOUPs 300mm or
SMIF 200mm
Measurement Range: 5m/sq - 5M/sq
Repeatability: (VLSI) < 0.2% (1o)
Accuracy: (VLSII) ±1%
Edge Exclusion: 1mm from edge of film
Temperature Accuracy: ±0.5C
Temperature Repeatability: ±0.2C
Throughput (5-site): 85WPH
Alignment System: Camera
Factory Automation: SECS/GEM
HSMS, E40/E94/E90, E84, E87
Computer OS : Windows NT
Computer Configuration: P3 733MHz; 256MB RAM; 18GB HDD