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Used Wafer Equipment

434 results
1

CHOOSE 4″ OR 6″ ROTOR SPECIAL ORDER ROTOR FOR 8″ WAFERS (INCLUDES 1 CUSTOM TEFLON CASSETTE Location : AMERICA North (USA-Canada-Mexico)

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Horizontal spin axis, for up to 6″ wafers Location : AMERICA North (USA-Canada-Mexico)

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RHM-06 probe station 6″ wafer chuck, 6×6″ travel Calibrated B&L zoom 7 optics Location : AMERICA North (USA-Canada-Mexico)

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Mask Aligner is 7″ in diameter lens includes microscope (not shown) and 350 watt lamp. Location : AMERICA North (USA-Canada-Mexico)

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382 AUTO FILM FRAME MOUNTER (BONDER) INCLUDES QTY 25 6″ FILM FRAMES Location : AMERICA North (USA-Canada-Mexico)

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1000 WATT POWER SUPPLY 1 MICRON RESOLUTION ON 6″ WAFERS SPLIT FIELD MICROSCOPE WITH 6 OBJECTIVES Similar to K& Location : AMERICA North (USA-Canada-Mexico)

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QUINTEL 7000 HIGH RESOLUTION MASK ALIGNER CURRENTLY CONFIGURED FOR 4″ DIAMETER (WILL EXPOSE LARGER PARTS) WITH Location : AMERICA North (USA-Canada-Mexico)

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UPGRADED COBILT CA 800, SET UP FOR 2″, 3″ OR 4″ WAFERS INCLUDES SPLIT FEILD OPTICS, 2 TO 3 MICRON RESOLUTION Location : AMERICA North (USA-Canada-Mexico)

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10″ COLLIMATED LENS FOR UP TO 6X6″ SQUARES OR 200mm WAFERS STEREO ZOOM OPTICS 350 WATT POWER SUPPLY, NEW LAMP Location : AMERICA North (USA-Canada-Mexico)

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8097 MASK ALIGNER 10″ DIAMETER LENS 350 WATT LAMP (CAN BE UPGRADED TO HIGHER POWER FOR ADDITIONAL COST) 4X4″ M Location : AMERICA North (USA-Canada-Mexico)

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with 10″ collimating lenses, for up to 8″ 200mm wafers. * Dual 1000 watt power supplies. * Dual 1000 watt lamp Location : AMERICA North (USA-Canada-Mexico)

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Exposure on 300mm wafers or 12×12″ substrates with up to 1 micron resolution 2000 watt power supply and lamp M Location : AMERICA North (USA-Canada-Mexico)

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STYLUS TYPE PROFILOMETER FOR MEASURING STEPS ON UP TO 6" WAFERS 360 DEGREE STAGE ROTATION 100 ANGSTROM TO 1310 Location : AMERICA North (USA-Canada-Mexico)

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WAFER TESTER FOR WAFER THICKNESS INCLUDES LARGE ANVIL STYLE TABLE TO HOLD SMALL OR LARGE SUBSTRATES Location : AMERICA North (USA-Canada-Mexico)

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FOR MEASURING DIELECTRIC THIN FILMS ON WAFERS UP TO 8" DIAMETER INCLUDES COMPUTER WITH MAPPING Location : AMERICA North (USA-Canada-Mexico)

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Substrate Size 75mm Wafer Size Range Maximum 75 mm Controller Type Microprocessor Controller Type Contr Location : AMERICA North (USA-Canada-Mexico)

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Spray Solvent Tool Accessories Chemical delivery module. Dual heated chemical tanks, 6 Gal. Dual chemical p Location : AMERICA North (USA-Canada-Mexico)

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Spray Solvent Tool Features: Front loading with on-axis spin Self-contained fluid dispensing and recirculatio Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)

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Microscope Configuration Brightfield, Darkfield & DIC Illumination Type Reflected Light Eyepieces Model Location : AMERICA North (USA-Canada-Mexico)

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Microscope Type Compound Multiple Objectives Models American Optical Microscope Objectives: 4/.12 Plan ach Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Maximum 150 mm Microscope Type Microzoom X-Y Optics Motion YES Vacuum Chuck Diamet Location : AMERICA North (USA-Canada-Mexico)

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Description: Other Information Wafer Size: 4 to 8" Tape Tension: Programmable Cycle Time: 30 seconds for a 6 Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 100 mm Set Size 100 mm Other Information Chucks:2"-3"-4" Po Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 100 mm Mask Plate Size 5'' x 5'' Alignment Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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Microscope Type Upright Microscope Configuration Brightfield, Darkfield & DIC Illumination Type Reflected L Location : AMERICA North (USA-Canada-Mexico)

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You can find used Wafer Equipment on Wotol

The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics

The main model  MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150,  6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880

HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers. 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices

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