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Used Wafer Equipment

355 results
1

Wafer PROBER WITH HOT CHUCK Version: 200 mm Year(s) : 2004 Location : AMERICA North (USA-Canada-Mexico)

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- CT62 Programmable Process Controller - SN RC 20100 Location : AMERICA North (USA-Canada-Mexico)

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Max Wafer: 150mm Configuration: 1-Chamber SATExcellent Condition Guaranteed. - Spray Acid Tool (SAT) - Single... Location : AMERICA North (USA-Canada-Mexico)

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MSA840 Mounting Machine Condition Poor Year(s) : 2005 Location : EUROPE (Western and Northern)

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ATM-105-1-S-CE-S293 Robot Location : AMERICA North (USA-Canada-Mexico)

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Model: 1-0080-10 2 UNITS 001-0080-09 2 UNITS 10080-9 3 UNITS 10080-07 2 UNITS OEM:Equipe Brooks Automat... Location : AMERICA North (USA-Canada-Mexico)

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Max Wafer: 200mm System Dimensions: 30x40x66 Weight: 695 lbs - Automatic Surface Inspection System - Bare W... Location : AMERICA North (USA-Canada-Mexico)

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Max Wafer: 150mm System Dimensions: 74x43x76 Weight: 2754 lbs - Double Darkfield Inspection Tool - SECS I... Year(s) : 2008 Location : AMERICA North (USA-Canada-Mexico)

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Griding Plate Revolution : 10-490 RPM Sample Mouting Unit : Heat / cool unit(110 deg max.), Built-in vacuum pu... Location : ASIA (North East)

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Observation method : fluorescence, phase difference and fluorescence + phase difference Magnifications : 50,... Location : ASIA (North East)

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Wafer Size 8 - Micro Head II V sr (Standard) with 2um stylus. - Measurement Vertical Range: 327㎛. - Stylus For... Location : ASIA (North East)

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Max Wafer: 200mm System Dimensions: 36x38x28 Weight: 230 lbs - Wafer Inspection Microscope - Brightfield... Location : AMERICA North (USA-Canada-Mexico)

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- 8"/200mm Wafer Capable System - Fully Automated Non-Contact Box-In-Box Measurement (Stepper Alignment) - Use... Location : AMERICA North (USA-Canada-Mexico)

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Max Wafer: 300mm Configuration: 150/200/300mm Wafer Capable, Dual Beam Spectrometry, Spectroscopic Elipsom... Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)

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Max Wafer: 200mm Configuration: 8"/200mm Wafer Capable, Calibrated to P-10 Specifications - Manual wafer l... Location : AMERICA North (USA-Canada-Mexico)

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Details - Bare Wafer Surface Defect Inspection System - Max Wafer Capable: 8”/200mm - Defect Sensitivity: 0.12... Location : AMERICA North (USA-Canada-Mexico)

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Specifications: • Bench top programmable accurate thickness and thickness variation (TTV) measurement system... Location : AMERICA North (USA-Canada-Mexico)

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includes shuttle stage for 200mm wafers Stainless enclosure microscope is additional Refurbished condition Location : EUROPE (Western and Northern)

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Features: RF etch DC and RF deposition stations PE 2KW RF power supply AE MDX DC P/S Digit... Location : AMERICA North (USA-Canada-Mexico)

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Features: 3 source system 2/Deposition and 1/RF DC bias Main processing system with load lock Capa... Location : AMERICA North (USA-Canada-Mexico)

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Features: 10x objectives 1000-watt lamphouse UV 400 diffraction reducing optics 365nm/405nm in... Location : AMERICA North (USA-Canada-Mexico)

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Specifications: For wafers from 2" to 6" or substrates from 3" x 3" up to 6"6" Fiber optics tube: 2 ar... Location : AMERICA North (USA-Canada-Mexico)

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Specifications: UV broadband (250nm-450nm), I-line (365nm) and G-line (436nm) wavelength available. Contac... Location : AMERICA North (USA-Canada-Mexico)

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Specifications: System capable of 3" to 5" Cassette to Cassette 350 W Lamp UV-400 Exposure op... Location : AMERICA North (USA-Canada-Mexico)

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Features: Accommodates wafers up to 8" 2 channel brightfield microscope Three position turret nos... Location : AMERICA North (USA-Canada-Mexico)

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