Used Wafer Equipment
343 resultsNSR-S208D, 300mm, S/N 8732041 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Minimum 50 mm Maximum 100 mm Set Size 100 mm Other Information Chucks:2"-3"-4" Po... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Set Size 100 mm Mask Plate Size 5'' x 5'' Alignment... Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMicroscope Type Upright Microscope Configuration Brightfield, Darkfield & DIC Illumination Type Reflected L... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription Wafer Backlapping Film Applicator -- 6" Other Information Set up for 6" wafers Power Requiremen... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSubstrate Size Up to 380MM Controller Model PCS 102 Resistivity Monitor YES Timer Duration 0-3 hours SRD C... Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Maximum 75 mm Anti Static Probes YES Heated Nitrogen YES Rotors Included YES Controll... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDiameter 6.0000 in (152.40 mm) Plating Material Nickel Number of Micropositioners 0 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Set Size 150 mm Microscope Type Stereo Zoom X-Y Optics Motion YES Vacuum Chuck Dia... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMicroscope Type Stereo Zoom Vacuum Chuck Diameter 6.0000 in (152.40 mm) Plating Material Stainless... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBinocular Angle 45° Eyepieces Model 31-15-71 Magnification 10 X Field Number 20 mm Trinocular/Phot... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVacuum Chuck Diameter 5.9055 in (150.00 mm) Plating Material Stainless steel Description Analytical... Location : AMERICA North (USA-Canada-Mexico)
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More detailsExterior Dimensions Width 9.500 in (24.1 cm) Depth 9.500 in (24.1 cm) Height 18.000 in (45.7... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Mounter Condition Good Location : EUROPE (Western and Northern)
Price : On request
More detailsImplant Dose Measurement Condition Very Good Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsDelaminator Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 mm Cassette to Cassette YES Acce... Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Laminator Condition Excellent Accessories 1 HP monitor 1 PC mouse 1 keyboard Year(s) : 2018 Location : EUROPE (Western and Northern)
Price : On request
More details- 8" Configured (can change to 6") - Quartz plasma tube and baffles - ASTEX Microwave 1.2kw - Temperature Cont... Location : ASIA (North East)
Price : On request
More details2300 Exelan Flex EX+ Year(s) : 2011 Location : ASIA (North East)
Price : On request
More detailsTELIUS Wafer Size 12 Year(s) : 2004 Location : ASIA (North East)
Price : On request
More detailsμ-Asher Wafer Size 8 Location : ASIA (North East)
Price : On request
More detailsUnity lle 85DI Wafer Size 8 Year(s) : 1998 Location : ASIA (North East)
Price : On request
More detailsUnity ME 85 SCCM Year(s) : 2005 Location : ASIA (North East)
Price : On request
More detailsIINDY-B-L Wafer Size 300 Year(s) : 2006 Location : ASIA (North East)
Price : On request
More detailsP-12XLM Wafer Size 300mm Year(s) : 2006 Location : ASIA (North East)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices