Used Wafer Equipment
408 resultsProcess: poly CMP Manufacturer: Novellus Systems Good condition Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailstrans: Wafer Management System Location : ASIA (North East)
Price : On request
More detailsWafer Stepper Year(s) : 2017 Location : EUROPE (Western and Northern)
Price : On request
More detailsOEM Group 470S SRD High Performance Spin Rinse Dryer Wafer Cleaner. The SRD is a 25 wafer, batch size, single Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSteag (AG Associates) Heatpulse 610 RTP Rapid Thermal Processing System. Manually loaded and capable of proce Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSemitool STI 870 Spin Rinser Dryer Double Stack. 6” Wafer Rotor in the top spinner and a 4" Rotor in the bott Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSUSS MICROTEC MJB3 MASK ALIGNER consisting of: - Model: MJB3 Main System - Manufacturer: Suss MicroTec Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer weighing system - Filmthickness Wafer Size Range Set Size 200 mm Accessories Wafer Scale (Mettle Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer weighing system - Filmthickness Wafer Size Range Minimum 200 mm Maximum 300 mm Other Informatio Year(s) : 2017 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer weighing system - Filmthickness Wafer Size Range Set Size 200 mm Accessories Last Calibration of W Year(s) : 2015 Location : EUROPE (Western and Northern)
Price : On request
More detailsGrinder Heavy smoker DTU 150 Chiller DVC 010 Vacuum coolant unit Air supply source: Pressure: 0.5-0.8 MPa Location : ASIA (South East)
Price : On request
More detailsgood condition Location : EUROPE (Western and Northern)
Price : On request
More detailsNitto De-Taper, sold in working condition Year(s) : 1999 Location : EUROPE (Western and Northern)
Price : On request
More details• Wafer Size Capability: 5 – 8 inch • Version: 150 mm • Beam Energy: Up to 200 keV • Dose Range: 1×10¹⁰ – 1×10 Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCleaner/Wafer Year(s) : 2005 Location : ASIA (North East)
Price : On request
More details• Wafer Size: 200 mm • Chuck Type: Temperature controlled (no chiller or controller included) • Microscope: Mi Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsKLA-Tencor UV 1280 SE Film Thickness Measurement Tool 6", 8" 2001 Vintage Year(s) : 2001 Location : EUROPE (Western and Northern)
Price : On request
More details• Type: Rapid Thermal Processing System • Wafer Sizes: Small pieces, 2", 3", 4", 5", 6", 8" (currently configu Year(s) : 2021 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Type: Manual probe station • Optics: B&L stereo zoom 4 • Optional upgrade: Zoom 5 (+$100), Zoom 7 (+$400) • Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Wafer size: 4″ • Optics: Mitutoyo high-power microscope with Microzoom optics • Objectives: 2 included • Chu Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCanon FPA- 5500iZ+ Wafer Size Range Minimum 300 mm Maximum 300 mm Set Size 300 mm Other Information Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsGeneral Configuration: FPA 3000 - i5(+) Manufactured in June / 1997 8“ Wafer Chuck, Notch PA unit 6“ Nikon-ty Year(s) : 1997 Location : EUROPE (Western and Northern)
Price : On request
More detailsAS-IS Refurbish Wafer Size: 200mm PROCESS: PHOTO WAFER FLOW DIRECTION RIGHT TO LEFT LOADING CONFIG 4 CASSETTE Year(s) : 1995 Location : EUROPE (Western and Northern)
Price : On request
More details- Wafer Size: 300 mm - Chuck Type: Femtoguard temperature chuck - Temperature Range: -60°C to +300°C - S Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMax Wafer: 200mm System Dimensions: 30x40x66 Weight: 695 lbs - Automatic Surface Inspection System - Bare W Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices