Bio-Rad QS-1200 Automated FT-IR Spectrometer

Bio-Rad QS-1200 Automated FT-IR Spectrometer -
an epitaxial-film metrology system for non-destructive measurement
of epitaxial silicon film thickness, supplied with its optical bench
(less interferometer), automatic wafer-mapping stage,
system controller, and documentation.

System Highlights
- Non-destructive measurement of epitaxial silicon film thickness by FT-IR
- Bio-Rad MAP300 automatic scanning stage for hands-off wafer mapping
- Manual load for wafers up to 300 mm; up to 320 test points
with 5 mm minimum
edge exclusion and full 3D wafer mapping
- Both reflectance and transmission measurement modes

FTS-175 Optical Bench
- Interferometer not included
- Dual-frequency IR source assembly (single IR source installed)
- Upgraded HeNe laser

System Controller (included)
- Control PC running Windows XP with monitor, keyboard & mouse
- Win-IR Pro (Rev. 2.51) application software
- QS-500 Epi (Rev. 1.31) application software
- Microsoft Access database application

Included
- System, applications, and site-preparation manuals
- PIKE Technologies MAP300 / MappIR programmable stage

Not Included
- FTS Power supply
- Interferometer