Clusterline CLN200

Manufacturer Evatec Clusterline
The Clusterline 200 systems offeredis equipped with 5 single process chambers each.
They were used only for reactive sputtering of SiO2 layers on 150mm blank Si wafers.
Both systems are still in a clean room and in working conditions.
Further devices mounted on these tools are: two vacuum loadports each,
wafer aligners, buffer stations for upto 5 wafers, OCR back side readers.
Handler Type MX800.
5x Pulsed DC chambers with RF on Chuck
Configured for 150mm Running in Production.