eLINE Plus EBL System

Brand Raith
Raith eLINE Plus EBL system (installed 2012)
Main system
Electronics control rack
Diaphragm vacuum pump
UPS
Chiller

Smallest beam size in the world of a professional EBL system
Ultra-high resolution patterning (sub-5 nm linewidth in EBL resist,
sub-7 nm lines using electron beam induced deposition (EBID)
techniques achievable)

Unique continuous stitch-error free writing modes, traxx and periodixx
Uncompromising EBL infrastructure with
complementary in-situ nanoengineering
options for broadest bandwidth of applications

Smart nanomanipulators for in-situ nanoprobing and nanoprofilometry
Professional gas injection system for focused electron beam
induced processes
(FEBIP) such as deposition, etching or 3D nanosculpturing

Upgradability at any time and open platform concept for customization
Comprehensive Raith Nanosuite software with
true multi-user management
Multi Technique Electron Beam Lithography

Product specifications
Beam energy 20 eV – 30 keV
Beam current 5 pA – 20 nA
Writing speed 0.125 Hz – 20 MHz pixel frequency
Stage travel range / sample size 100 mm / ≤ 4 inch wafer
Beam size ≤ 1.6 nm @ 20 keV
Beam current density ≥ 7500 A / cm2
Beam current drift ≤ 0,5% / 8 hours
Minimum grating periodicity ≤ 40 nm
Minimum linewidth ≤ 8 nm
Stitching accuracy ≤ 40 nm (mean+3σ)
Overlay accuracy ≤ 40 nm (mean+3σ)

Raith eLINE Plus Electron Beam Lithography System –
Multi-Disciplinary Nanofabrication Tool

For sale: Raith eLINE Plus e-beam lithography system,
engineered for high-precision patterning and nanoscale fabrication across a
wide range of scientific and industrial research applications.

System Highlights:
High-resolution electron beam lithography
Ideal for R&D labs, universities, and nanotechnology centers
Supports complex patterning, imaging,
and nanocharacterization workflows
Application Areas:

Nano-Photonics: Photonic crystals, gratings, waveguides
Quantum Devices: Quantum dots, CNT graphene, SETs, nanowires
Nano-Electronics: Spintronics, molecular electronics,
nano-imprint lithography
Energy Devices: Solar cells, fuel cells, nano-catalysts
Materials Science: Nano-composites, meta-materials, self-assembly
Nano-Biotech & Medicine: Micro/nano-fluidics, implants, biosensors
MEMS/NEMS: Nano-mechanical devices, magneto-resistive elements

Integrated Capabilities Include:
Precision lithography with advanced control
Electrical & mechanical probing
AFM support
EBID/EBIE for direct-write applications
Profilometry, navigation, and metrology functions
Chemical & structural analysis
This Raith eLINE Plus is ideal for interdisciplinary nanofabrication
projects requiring reliability, resolution, and application flexibility.