Used Lithography & Photoresist
206 resultsStepper:Lithography Step and repeat scanning system Location : ASIA (North East)
Price : On request
More details- Wafer Size Range: 200 mm - Condition: Good - Manufacturing Date: 2004 - Width: 354.0 cm (139.37 in) Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsBI100, s/n: BA002A408JR Year(s) : 2017 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsStepper:Lithography Step and repeat scanning system Location : ASIA (North East)
Price : On request
More detailsStepper Wafer size: 6" Condition: as is Year(s) : 1994 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer size 300mm Tool Status Running Wafers Fab Section Lithography Asset Description 2-Block-Machine Softwar Year(s) : 2005 Location : EUROPE (Western and Northern)
Price : On request
More detailsLIthography System Model 2450L DI DUO Year(s) : 2018 Location : AMERICA North (USA-Canada-Mexico)
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More detailsDry Film Photoresist Laminator with LC-2400 Vacuum Base and Teknik PC600DT tacky roller cleaner 208/220 Vac, 1 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLDI with 16W laser, Metric model (m), resolution: 5 / 2.5 µm, max. substrate size: 635 x 812 mm, max subst Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsLDI with 8W laser, Metric model (Hm), resolution: 5 / 2.5 µm, max. substrate size: 635 x 812 mm, substrate Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsThe Raider ECD system for 150mm-300mm single-wafer, automated, multi-chamber, electrochemical deposition deli Location : AMERICA North (USA-Canada-Mexico)
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More detailsVintages: 3x 1995 1x1996 Configuration: left inline system; Inline with TEL Mark 7-S Coater Developer 8" w Year(s) : 1995, 1996 Location : EUROPE (Western and Northern)
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More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier ASML Model AT400C Vinta Year(s) : 2004 Location : United States (USA)
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More detailsWafer Size 200 mm Fab Section Lithography General Product Information Vendor Supplier ASML Model 5500/275D As Year(s) : 1998 Location : United States (USA)
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More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier ASML Model AT850C Vinta Year(s) : 2004 Location : United States (USA)
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More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier ASML Model NXT1950i PEP Year(s) : 2011 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier TEL Model LITHIUS Vinta Year(s) : 2008 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier ASML Model AT850D Vinta Year(s) : 2004 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier TEL Model LITHIUS Vinta Year(s) : 2005 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier ASML Model XT1400E Vint Year(s) : 2007 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier ASML Model XT1900Gi Vin Year(s) : 2008 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier TEL Model LITHIUS Vinta Year(s) : 2006 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier TEL Model LITHIUS Vinta Year(s) : 2006 Location : United States (USA)
Price : On request
More detailsLithography Equipment 300mm Year(s) : 2011 Location : United States (USA)
Price : On request
More details300mm, s/n: 0030 Lithography Equipment Year(s) : 2017 Location : United States (USA)
Price : On request
More detailsYou can find used Lithography & Photoresist on Wotol
The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,
The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000, PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U, M150PC, BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640, MJB-55,
HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.