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Used Lithography & Photoresist

163 results
1

Photomask Pellicle Mounting System Year(s) : 1995 Location : AMERICA North (USA-Canada-Mexico)

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Centura, 300mm, S/N 423383-XA-APRJ Tool ID: ETX2290 Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)

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1

Ecomet 3 Polisher Grinder with Automet 2 Power Head. Variable speed grinder polisher with 8” wheel. Constant w... Location : AMERICA North (USA-Canada-Mexico)

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CT-3600 Photovoltaics Solar Panel Cell Tester Assembly with Sorter Location : AMERICA North (USA-Canada-Mexico)

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DT-3000, SOH Coater, 300mm, Resist/Poly Spin coater DUO 4 CUP + 12 PCDH + 6 CP 4 CUP + 12 PCDH + 6 CP Location : AMERICA North (USA-Canada-Mexico)

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AIMS 32-193i, Photomask Repair System Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)

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Brand: Electroglas Model:2001 Prober Used Details: extremely accurate modularly designed automatic waf... Location : AMERICA North (USA-Canada-Mexico)

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Brand: Electroglas Model:1034 Prober Used Details: The ELECTROGLAS 1034 (EG 1034XA and EG 1034X-6A) Aut... Location : AMERICA North (USA-Canada-Mexico)

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The Branson/IPC L3200 is self-diagnostic, and can store up to 26 recipes. This dual-chamber, dual-cassette sys... Location : AMERICA North (USA-Canada-Mexico)

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3

Resist Developer is in excellent condition, fully operational and ready to be shipped from our warehouse in Ru... Location : RUSSIA and Central Asia

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Flat Panel Display Photoresist Coater and Developer system Version: Gen 3.5 Year(s) : 2002 Location : AMERICA North (USA-Canada-Mexico)

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single chuck coater for resist coatings 2Â photoresist pumps max 9" wafer or 6" square substrate Location : AMERICA North (USA-Canada-Mexico)

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photoresist coater Gyrset closed cover coating technology Wafer size up to 200mm 2 Wafertec photo resist pumps... Location : AMERICA North (USA-Canada-Mexico)

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1

XT:1700Gi, 300mm, Immersion LIthography Idle. Installed Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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Immersion Lithography System Version: 300 mm Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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Minimum 150 mm Maximum 200 mm Set Size 150 mm Photoresist Type Positive Condition Very Good Year(s) : 2000 Location : EUROPE (Western and Northern)

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Caliper Q300, Nanometrics, 300mm, Overlay Measurement Location : AMERICA North (USA-Canada-Mexico)

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1

Matsushita Seiki, M515, Photomask Pellicle Automounter Year(s) : 2016 Location : AMERICA North (USA-Canada-Mexico)

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Series 2000 Description: Plasma Barrel Photoresist Location : AMERICA North (USA-Canada-Mexico)

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Power Requirements 208 V 30.0 A 80.0 A(2) 60 Hz 1 Phase Serial Number(s) SN:18E3503-12 Year(s) : 2002 Location : EUROPE (Western and Northern)

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Minimum 150 mm Maximum 200 mm Set Size 200 mm Photoresist Type Positive Number of Tracks 3 Location : EUROPE (Western and Northern)

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Safety cover for the operator, to minimize accidental contact with a Hot Surface Physical shield to the heater... Location : EUROPE (Western and Northern)

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1

EMS 1000 model with the same specification and options. With the slightly higher achievable ramp rate of 30°C/... Location : EUROPE (Western and Northern)

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1

APT 9154-EP Acid Spray Cassette to Cassette Three Nozzle spray system Nitrogen dry Temperature and Spin RPM co... Location : AMERICA North (USA-Canada-Mexico)

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Fusion Gemini UV,High Intensity Sourced UV/Bake for resist photostabilization,Dual Chamber, Dual Cassette,In-s... Location : AMERICA North (USA-Canada-Mexico)

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You can find used Lithography & Photoresist on Wotol

The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,

The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000,  PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U,  M150PC,  BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640,  MJB-55,

HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment 
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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