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Used Lithography & Photoresist

161 results
1

single chuck coater for resist coatings 2Â photoresist pumps max 9" wafer or 6" square substrate Location : AMERICA North (USA-Canada-Mexico)

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photoresist coater Gyrset closed cover coating technology Wafer size up to 200mm 2 Wafertec photo resist pumps... Location : AMERICA North (USA-Canada-Mexico)

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XT:1250B, 300mm, ArF Location : AMERICA North (USA-Canada-Mexico)

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XT:1700Gi, 300mm, Immersion LIthography Idle. Installed Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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5
Texas Instruments - Unique Offering of Semiconductor Design & Manufacturing Tools

Featuring: TEL "TRIAS" Metal CVD Kyowa Interface Science "Drop Master 700D” Contact Angle Measurement Tester J... Location : United States (USA)

Liquidity Services
Dec, 30

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1

Immersion Lithography System Version: 300 mm Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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Minimum 150 mm Maximum 200 mm Set Size 150 mm Photoresist Type Positive Condition Very Good Year(s) : 2000 Location : EUROPE (Western and Northern)

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M515-III Description Photomask Pellicle Mounting Location : AMERICA North (USA-Canada-Mexico)

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Caliper Q300, Nanometrics, 300mm, Overlay Measurement Location : AMERICA North (USA-Canada-Mexico)

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Matsushita Seiki, M515, Photomask Pellicle Automounter Year(s) : 2016 Location : AMERICA North (USA-Canada-Mexico)

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Series 2000 Description: Plasma Barrel Photoresist Location : AMERICA North (USA-Canada-Mexico)

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Power Requirements 208 V 30.0 A 80.0 A(2) 60 Hz 1 Phase Serial Number(s) SN:18E3503-12 Year(s) : 2002 Location : EUROPE (Western and Northern)

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Minimum 150 mm Maximum 200 mm Set Size 200 mm Photoresist Type Positive Number of Tracks 3 Location : EUROPE (Western and Northern)

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TERA 21, 300mm, Photoresist strip S/N : PTK06042 Bagged & skidded in Warehouse Tool ID: EA-EOI-13 Location : AMERICA North (USA-Canada-Mexico)

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Safety cover for the operator, to minimize accidental contact with a Hot Surface Physical shield to the heater... Location : EUROPE (Western and Northern)

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1

EMS 1000 model with the same specification and options. With the slightly higher achievable ramp rate of 30°C/... Location : EUROPE (Western and Northern)

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APT 9154-EP Acid Spray Cassette to Cassette Three Nozzle spray system Nitrogen dry Temperature and Spin RPM co... Location : AMERICA North (USA-Canada-Mexico)

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Fusion Gemini UV,High Intensity Sourced UV/Bake for resist photostabilization,Dual Chamber, Dual Cassette,In-s... Location : AMERICA North (USA-Canada-Mexico)

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Fusion Gemini UV Photostablizer,Cassette,In-situ Irradiance monitoring and feed back,Ten user configuration ir... Location : AMERICA North (USA-Canada-Mexico)

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Karl Suss MA56 topside mask aligner, Resolution: 3 µm (proximity) 0.8-1µm (vacuum contact),Capable of Hard Con... Location : AMERICA North (USA-Canada-Mexico)

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1

Single Block (Resist Coater/Developer) Version: 300mm Year(s) : 2002 Location : AMERICA North (USA-Canada-Mexico)

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0

Planar Pulsar Chemical Resist/Strip serial 52700-6306 Year(s) : 1993 Location : AMERICA North (USA-Canada-Mexico)

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Automated Resist Processing System Spray Resist Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)

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1

LDI with 8W laser, Metric model (Hm), resolution: 5 / 2.5 µm, max. substrate size: 635 x 812 mm, substrate thi... Year(s) : 2008 Location : EUROPE (Western and Northern)

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Configuration: Canon Part# Y60-1095-R00 XY wafer stage, Fully refurbished Suitable for Canon FPA-3000 i5 stepp... Location : AMERICA North (USA-Canada-Mexico)

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Configuration: Wafer size: 4" / 6" / 8" (customer may specify per their requirement) Reticle size: 6" Square... Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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