Used Lithography & Photoresist
134 resultsLoad: automatic cassette to cassette Beltless Elevator Cassette: Fluoroware 72 and 82 series Throu Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Maximum 200 mm Number of Tracks 0 Number of Photoresist Coat Stations 1 Number of Photo Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTechnology Group) www.abmfg.com System configured for wafer to wafer alignment System components Camera: DAGE Year(s) : 1986 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCondition Excellent Power Requirements 208 V 50/60 Hz 3 Phase CE Marked YES Exterior Dimensions Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsRF Generator Model ENI OEM 12 External Cooling Water Cooled Power Requirements 208 V 30.0 A 60 Hz Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Control Panel has 5 potentiometers for speed setting with individual 0-99.9s timers. - Can be operated in Au Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhoto-lithography 248 NM DUV Scanner with photo-track Version: 300 MM Vintage: 01.06.2002 The equipmewnt has Year(s) : 2002 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAutomated Photoresist Coater Version: 200 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAutomated Photoresist Coater Version: 150 mm/200 mm Automatic Shut down in Fab. Needs to be removed in the ne Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAutomated Photoresist Coater Version: 150 mm/200 mm Vintage: Inquire Automatic Shut down in Fab. Needs to be r Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAutomated Photoresist Coater Version: 200 mm Automatic Shut down in Fab. Needs to be removed in the next few Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhotoresist Coater and Developer tRACK, SOG type Version: 100 mm to 150 mm for Wafer Size: 4"- 6" Coater syst Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhotoresist coater and developer track with 3C and 3D Version: 200 mm Vintage: 01.09.2001 Recently de-installe Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFor Mark7 photoresist coater and developer De-installed from working condition and warehoused. For current co Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLead Time: immediately Sales Price: Inquire Comments: De-installed from working condition and warehoused. Year(s) : 1995 Location : AMERICA North (USA-Canada-Mexico)
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More details-Has CE mark -Still installed and operational -Can be demoed by appointment -It is scheduled to be released fo Year(s) : 2004 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhotoresist Coater and Developer Track Version: 300 mm Vintage: 01.06.2007 -Has CE mark -Still installed an Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Chuck Size: Configured with 4" chuck • Wafer Capacity: 6" capable Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDual Track Photoresist Coater With Hotplates Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsEC101 PHOTORESIST COATER (CB-15) WITH 15″ DIAMETER BOWL AND TABLE TOP STAND Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLarge substrate coater (typicially for photoresist) includes safety enclosure 6 six speeds 14 timers Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsHAS COAT BAKE AND DEVELOP STATIONS Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details4 HEAD PHOTORESIST COATER Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhotolithography Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSINGLE TRACK COATER WITH HOTPLATE Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Lithography & Photoresist on Wotol
The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,
The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000, PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U, M150PC, BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640, MJB-55,
HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.