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Used Lithography & Photoresist

211 results
1

PWM32 PHOTORESIST COATER 8 DIAMETER BOWL Location : AMERICA North (USA-Canada-Mexico)

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WS-400B-6NPPLITE PHOTO RESIST COATER PROGRAMMABLE 7″ BOWL, 1.5″ CHUCK Location : AMERICA North (USA-Canada-Mexico)

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DUAL TRACKS COAT, BAKE DEVELOP BAKE CONFIGURED FOR 6″ WAFERS Location : AMERICA North (USA-Canada-Mexico)

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PLASMA ASHER ALUMINUM CHAMBER ID 6X6X10″ WIDE Location : AMERICA North (USA-Canada-Mexico)

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Volts 110 Cycle 60 Phase 1 Location : AMERICA North (USA-Canada-Mexico)

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Description  Lapping Machine -- Single Sided Plate Diameter  12.00  in  (30.48 cm) Water Cooled Lap Plate  No Location : AMERICA North (USA-Canada-Mexico)

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Features and Specifications: Resist Uniformity: 75 angstroms, 3 sigma Microprocessor Controlled (10 program c Year(s) : 1988 Location : AMERICA North (USA-Canada-Mexico)

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Condition Very Good Operating Air Pressure 80.00 PSI (551,624.00 N/sq m) Exterior Dimensions Width 35 Year(s) : 1985 Location : AMERICA North (USA-Canada-Mexico)

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Load: automatic cassette to cassette Beltless Elevator Cassette: Fluoroware 72 and 82 series Throu Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Maximum 200 mm Number of Tracks 0 Number of Photoresist Coat Stations 1 Number of Photo Location : AMERICA North (USA-Canada-Mexico)

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OPTITRAC 6" Photoresist Developer Track. Developer track is currently configured for 6" wafers. System configu Location : AMERICA North (USA-Canada-Mexico)

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Photoresist Spinner Coater Location : AMERICA North (USA-Canada-Mexico)

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Litho: exposure Year(s) : 2004 Location : ASIA (North East)

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Technology Group) www.abmfg.com System configured for wafer to wafer alignment System components Camera: DAGE Year(s) : 1986 Location : AMERICA North (USA-Canada-Mexico)

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Condition Excellent Power Requirements 208 V 50/60 Hz 3 Phase CE Marked YES Exterior Dimensions Location : AMERICA North (USA-Canada-Mexico)

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RF Generator Model ENI OEM 12 External Cooling Water Cooled Power Requirements 208 V 30.0 A 60 Hz Location : AMERICA North (USA-Canada-Mexico)

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CT-3600 Photovoltaics Solar Panel Cell Tester Assembly with Sorter Location : AMERICA North (USA-Canada-Mexico)

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3

Resist Developer is in excellent condition, fully operational and ready to be shipped from our warehouse in Ru Location : RUSSIA and Central Asia

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single chuck coater for resist coatings 2Â photoresist pumps max 9" wafer or 6" square substrate Location : AMERICA North (USA-Canada-Mexico)

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photoresist coater Gyrset closed cover coating technology Wafer size up to 200mm 2 Wafertec photo resist pumps Location : AMERICA North (USA-Canada-Mexico)

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Safety cover for the operator, to minimize accidental contact with a Hot Surface Physical shield to the heater Location : EUROPE (Western and Northern)

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EMS 1000 model with the same specification and options. With the slightly higher achievable ramp rate of 30°C/ Location : EUROPE (Western and Northern)

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Planar Pulsar Chemical Resist/Strip serial 52700-6306 Year(s) : 1993 Location : AMERICA North (USA-Canada-Mexico)

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Automated Resist Processing System Spray Resist Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)

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Configuration: Canon Part# Y60-1095-R00 XY wafer stage, Fully refurbished Suitable for Canon FPA-3000 i5 stepp Location : AMERICA North (USA-Canada-Mexico)

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You can find used Lithography & Photoresist on Wotol

The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,

The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000,  PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U,  M150PC,  BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640,  MJB-55,

HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment 
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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