Gasonics PEP 3510A/A Dual Chamber

Brand: GaSonics
Model:PEP 3510A/A Dual Chamber
The GaSonics PEP 3510A i
Aversatile microwave downstream
photoresist removal system,
designed for clean, damage
free removal of photoresist
PEP 3510A utilizes a combination of platen
and lamp wafer heating resulting in
excellent removal rates and uniformity
This system excels in bulk photoresist removal
and descum applications.

Used
Details:
Features:
Damage-free downstream microwave
1.2 kW source
Platen and lamp wafer heating
for process flexibility
Parallel, sequential and independent
process operation
Programmable process parameters
using GUI screens
Optical endpoint detection system
High throughput
Supports both 150mm
and 200mm wafers
Dual chamber processing
Cassette to cassette operation
with Yaskawa robot
Flush mount configuration
Automatic/manual operation modes
Multiple lot with sequential processing
using different recipes
Load station comes with touch screen control
Dual blade wafer handler
Quartz processing chamber
Closed-loop temperature controlled
(preheating only)
Ethernet, mouse, and keyboard connections