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Used Plasma Etcher / Asher

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Dry Etch Version: 300 mm Year(s) : 2013 Location : AMERICA North (USA-Canada-Mexico)

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Stripper/Asher Version: 300 mm Location : AMERICA North (USA-Canada-Mexico)

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Ion Beam Etch and Deposition System Version: 200 mm Year(s) : 2013 Location : AMERICA North (USA-Canada-Mexico)

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Equipment Details: Plasma etcher, 3"-6" Currently configured for 6" Polysilicon: 490 Upgraded TFT Monitor Main... Location : AMERICA North (USA-Canada-Mexico)

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Ion Beam Etch and Deposition System Version: 200 mm Year(s) : 2013 Location : AMERICA North (USA-Canada-Mexico)

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Etcher Type Box Rated Power Output 300 Watts Reactor Center Rectangular Reactor Center Size Width 9.75... Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Maximum 200 mm Process RIE/Plasma Etch Controller Type Microprocessor Controller Type... Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 100 mm Maximum 200 mm Process Plasma and Reactive Ion Etch Controller Type... Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Process DRIE PECVD Controller Type PC Controller Type... Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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Max Wafer: 200mm System Dimensions: 74x34x71 Configuration: 200mm platen, Load-locked single chamber, Ch... Location : AMERICA North (USA-Canada-Mexico)

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S314, S/N 11672, Vertical acid etcher Faulty equipment, please see details. Tool ID: 79X6660-AF Year(s) : 1987 Location : AMERICA North (USA-Canada-Mexico)

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Single Wafer Processing - Etch/Clean Version: 300 mm Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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Polysilicon Etch Version: 300 mm Year(s) : 2014 Location : AMERICA North (USA-Canada-Mexico)

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CDE300, 300mm, Isotropic Chemical Dry Etch Location : AMERICA North (USA-Canada-Mexico)

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DES-212-304AV Wafer Size 6 Year(s) : 1987 Location : ASIA (North East)

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SA-2060 Wafer Size 6 Year(s) : 1996 Location : ASIA (North East)

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Equipment Details: Etcher, 12" (3) Poly FI Type: Signal tower: 3-Color (3) Loadports ATM Robot Buffer station:... Year(s) : 2009 Location : AMERICA North (USA-Canada-Mexico)

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Chamber 4 Description Standard Lamp Heated (100-150mm capable) Configured for 100mm Nitride Process. Incl... Location : AMERICA North (USA-Canada-Mexico)

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Number of Chambers 3 Process Capabilities TEOS Deposition, Oxide Etch Accessories End point detection Other... Location : AMERICA North (USA-Canada-Mexico)

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Number of Gas Inputs Three Gas Vacuum Pump Included Yes Vacuum Pump Model Stokes Blower 615-2 with Stokes 1... Location : AMERICA North (USA-Canada-Mexico)

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Planar Magnetron Sputter Head YES Chamber Size - Cylindrical Diameter 4.13 in (10.49 cm) Height 4.3... Location : AMERICA North (USA-Canada-Mexico)

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dry: Etcher-Oxide Location : ASIA (North East)

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Dry Etcher-Si (Rapair) Location : ASIA (North East)

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Ferroelectric Etcher Version: 200 mm Location : AMERICA North (USA-Canada-Mexico)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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