Used Plasma Etcher / Asher
440 results- Downstream or Direct Plasma Asher - Microprocessor controlled - Two gas inputs plus Nitrogen input - Flow Me... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPILL Ätz- und Strippanlage Location : EUROPE (Western and Northern)
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More detailsMxP+ R2 Poly Etcher (3 chambers) Wafer Size 200mm The Oriental chamber not included Location : ASIA (North East)
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More detailsPlasma Asher, Rebuilt with Full Support. Other models available Location : AMERICA North (USA-Canada-Mexico)
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More detailsWet Etch Year(s) : 1993 Location : ASIA (North East)
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More detailsWafer Size: 12inch FLEX 45 (23F450455(F104683-PM2)) / 2007 RF Match: 853-040482-301 Pendulum Valve: Missing TM... Year(s) : 2007 Location : ASIA (North East)
Price : On request
More detailsMEC ETCH BOND line Item No.: 08209 Year(s) : 2007 Location : EUROPE (Western and Northern)
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More detailsUnity M SCCM, SN UM0033, 200mm, Etch Year(s) : 1985 Location : AMERICA North (USA-Canada-Mexico)
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More detailsCurrent working width is 350 mm (i.e. the machine is equipped with brushes of this working width). Working wid... Location : EUROPE (Western and Northern)
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More detailsDry-etcher/6in Year(s) : 1988 Location : ASIA (North East)
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More detailsChamber 21x22x21 inch; O2,Ar, 600w , 13.56MHz Location : AMERICA North (USA-Canada-Mexico)
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More detailsPlasma System w/ Technics PD-IIA Location : AMERICA North (USA-Canada-Mexico)
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More detailsPLC controlled and offers real-time plain English readout of system operating parameters together with remedia... Location : AMERICA North (USA-Canada-Mexico)
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More details– Used for photoresist stripping and surface cleaning, as well as etching silicon and its compounds – Chamber... Location : AMERICA North (USA-Canada-Mexico)
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More detailsFeatures include: Plug and play self installation Industrial computer with LCD touch panel and keyboa... Location : AMERICA North (USA-Canada-Mexico)
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More detailsPlasma Cleaning and Treatment System Bench Top System Touch Screen Control 13.56 MNz RF Generator Multiple Gas... Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
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More detailsBrand: Allwin21 AW-1008 Plasma Stripper/Asher Wafer Size: 3″ – 6″ Capability Wafer Loading: 3-axis Robot... Location : AMERICA North (USA-Canada-Mexico)
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More detailsBrand: Allwin21 Corp. Allwin21 Corp. AW-B3000 Plasma Asher Wafer Size: Small~8″ Wafers Wafer Loading: Man... Location : AMERICA North (USA-Canada-Mexico)
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More detailsBrand: Allwin21 Corp. Allwin21 Corp. AW-105R Plasma Asher Wafer Size: 2″ – 6″ Capability Wafer Loading: 3... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrand: Allwin21 Corp. Allwin21 Corp. AW-903e TTW Plasma Etch RIE Wafer Size: 3″ – 6″ Capability Wafer Loa... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrand: Allwin21 Corp. Allwin21 Corp. AW-901e TTW Plasma Etch RIE Wafer Size: 3″ – 6″ Capability Wafer Loa... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrand: Allwin21 Corp. Allwin21 Corp. AW-903e Plasma Etch RIE Wafer Size: 3″ – 6″ Capability Wafer Loading... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrand: Allwin21 Corp. Allwin21 Corp. AW-901e Plasma Etch RIE Wafer Size: 3″ – 6″ Capability Wafer Loading... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrand: Allwin21 Allwin21 AW-2001R Etcher Features: Designed with III-V Production in Mind. Controller wi... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Shelves, controller, and internal MFCs - Does not include the MKS vapor flow controller - ENI ACG-10B 1kW RF... Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XＳ5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.