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Used Plasma Etcher / Asher

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1

Brand: GaSonics Model: AE2001 Etch System Used Details: Microwave downstream etcher Features: Cassette to ca Location : AMERICA North (USA-Canada-Mexico)

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Brand: GaSonics Model: Aura 3010 Photoresist Asher Used Details: A downstream photoresist removal system A d Location : AMERICA North (USA-Canada-Mexico)

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Brand: GaSonics Model:PEP 3510A/A Dual Chamber The GaSonics PEP 3510A i Aversatile microwave downstream phot Location : AMERICA North (USA-Canada-Mexico)

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Brand: Branson Model: IPC 4000 Barrel Asher Used Details: Wafer capability up to 8" RF generator model PM11 Location : AMERICA North (USA-Canada-Mexico)

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Brand: Anatech Model:600 Series Model SP150 Quartz Barrel Plasma Asher / Desum Used Details: Barrel Plasma A Location : AMERICA North (USA-Canada-Mexico)

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Brand: SPEC Model:GaSonics 3510E PC Isotropic Etch System Used Details: SPEC Equipment has developed the new Location : AMERICA North (USA-Canada-Mexico)

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Brand: March Model: PX-1000 Batch RIE Asher/Etcher System Used Details: Downstream RIE or isotropic plasm Location : AMERICA North (USA-Canada-Mexico)

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Brand: GaSonics Model: Aura 3010 Photoresist Asher with SMIF Used Details: A downstream photoresist remova Location : AMERICA North (USA-Canada-Mexico)

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Brand: Gasonics Model: L3510 SINGLE WAFER ASHING SYSTEM Specifications - Enhanced reliability, serviceability Location : AMERICA North (USA-Canada-Mexico)

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Brand: GaSonics Model: L3500 Used Details: The GaSonics/IPC L3500 asher is a versatile system designed for Location : AMERICA North (USA-Canada-Mexico)

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Brand: Branson Model: V Dual quartz chambers for 100-150mm wafers cassette to cassette operation Used Detai Location : AMERICA North (USA-Canada-Mexico)

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Brand: Branson / IPC Model: 4000 BARREL ASHER Specifications - Wafer capability up to 8" - RF generator model Location : AMERICA North (USA-Canada-Mexico)

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Brand: GaSonics The GaSonics PEP Iridia is a dual chamber etcher used to independently deskin (remov Location : AMERICA North (USA-Canada-Mexico)

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Brand: Tegal Model: 903E Plasma Etch System Description: Cassette to cassette single wafer plasma etcher sy Location : AMERICA North (USA-Canada-Mexico)

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Brand: GaSonics Model: L3510E Isotropic Etch System Used Details: is a high etch rate downstream isotropic Location : AMERICA North (USA-Canada-Mexico)

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Brand: Branson Model: IPC L2101 Branson/IPC Mod. S2100-11220 Reactor Center Used Details: Features: One 12" Location : AMERICA North (USA-Canada-Mexico)

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Brand: GaSonics Model: AE-2000LL The GaSonics Aura Loadlock Isotropic Etcher Used Details: Is a microproces Location : AMERICA North (USA-Canada-Mexico)

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Brand: GaSonics Model: IPC Series 9104 Plasma Asher Used Details: 12" (diamater) 20" (D) quartz chamber Sy Location : AMERICA North (USA-Canada-Mexico)

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Brand: Technics Model: PEIIB Planar Etch Plasma System Used Details: Oxygen planar etcher may be used for s Location : AMERICA North (USA-Canada-Mexico)

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Brand: Matrix Model:105 low temperature asher Single wafer Used Details: Single cassette Microprocessor cont Location : AMERICA North (USA-Canada-Mexico)

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Brand: Plasma Model: 730 SLR PECVD Load-Locked System Used Details: with platen transfer Windows operating Location : AMERICA North (USA-Canada-Mexico)

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Brand: March Model: PX-1000 Batch Asher/Etcher System Used Details: Downstream RIE or isotropic plasma barr Location : AMERICA North (USA-Canada-Mexico)

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Novellus Model AURA 2000 Conation Id TQ024 Configuration Asher (Etch Front End) Location : AMERICA North (USA-Canada-Mexico)

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Novellus Model AURA 2000 Conation Id TQ087 Configuration Asher (C4) Location : AMERICA North (USA-Canada-Mexico)

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Novellus Model AURA 2000 Conation Id TQ025 Configuration Asher (Etch Front End) Location : AMERICA North (USA-Canada-Mexico)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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