Used Plasma Etcher / Asher
389 resultsEtcher Type Planar - Magnetron Rated Power Output 4000 Watts Reactor Center Rectangular Reactor Center Size Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Chlorine Etch Loadlock Loadloc Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Silicon Etch Bosch Process Loadlo Location : AMERICA North (USA-Canada-Mexico)
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More detailsMaximum 100 mm Process Plasma etch Controller Type Microprocessor Controller Type End Point Detection Yes Location : AMERICA North (USA-Canada-Mexico)
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More detailsRated Power Output 300 Watts Reactor Center Cylindrical Reactor Center Size Depth 12.00 in (30.48 cm) Location : AMERICA North (USA-Canada-Mexico)
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More detailsEtcher Type Box Rated Power Output 600 Watts Reactor Center Rectangular Reactor Center Size Width 12.0 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 75 mm Maximum 200 mm Set Size 150 mm Process Nitride Etch Controller Type Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Controller Type PC Controller Type High Vacuum Pump Le Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Maximum 150 mm Process Reactive Ion Etch System Controller Type PC Controller Type Hig Location : AMERICA North (USA-Canada-Mexico)
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More detailsPanel Meters Digital External Cooling Water Cooled Accessories MKS pressure transducer--Type 122A Seven s Location : AMERICA North (USA-Canada-Mexico)
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More details200 ACU Asher Serial Number: AU6A356AH Wafer Size: 200mm Location : AMERICA North (USA-Canada-Mexico)
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More detailsUltratech UltraStep 1500 wafer stepper. Wafer Size: 150mm Can be sold used as-is or refurbished with warranty, Location : AMERICA North (USA-Canada-Mexico)
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More detailsSingle chamber RIE etcher S/N 219656 150mm Configuration Location : AMERICA North (USA-Canada-Mexico)
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More detailsPolysilicon Dry Etch Chamber Version: 300 MM Vintage: 01.06.2012 TEL Tactras RLSA Etch Chamber TactrasTM RL Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
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More detailsXeF2 Etching System Version: Inquire Vintage: 01.06.2018 Year(s) : 2018 Location : AMERICA North (USA-Canada-Mexico)
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More details-Reaction Chamber Item CC1012-00100 s/n 10206 -RF Delivery Item CR1044-00201 s/n 10593 -Matching Network Item Year(s) : 1984 Location : AMERICA North (USA-Canada-Mexico)
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More details-Set up for load and unload of 4 inch wafers, cassette to cassette. -Sold Strictly "as is, where is", with con Year(s) : 1985 Location : AMERICA North (USA-Canada-Mexico)
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More detailsSpin Etcher Version: 300 mm Location : AMERICA North (USA-Canada-Mexico)
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More detailsPlasma Dry etcher Version: 200 mm Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)
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More detailsSingle Wafer Process Single Rotometer Controlled Gas Channel Multi-Step Process Cycle Capability Programmable Year(s) : 1987 Location : AMERICA North (USA-Canada-Mexico)
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More detailsManually Loaded Process Chamber with 8” (dia.) Cathode Gas Distribution Panel with 4ea Gas Channels MKS 14 Location : AMERICA North (USA-Canada-Mexico)
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More detailsAME 8100 Plasma Etcher used for reactive ion etching of oxides, nitrides, and resist descum. System is configu Location : AMERICA North (USA-Canada-Mexico)
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More detailsReactive Ion Etcher Location : AMERICA North (USA-Canada-Mexico)
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More detailsEtcher Location : AMERICA North (USA-Canada-Mexico)
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More detailsMarch Instruments PX ATM plasma system 1/4" ID quartz tubing. 115 volts. Possibly used to plasma clean ammo Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XＳ5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.