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Used Plasma Etcher / Asher

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Brand: Hoecrst Celanese Hoecrst Celanese, Semiconductor Safety Technology Guardian burn box, with 4" ASA i Location : AMERICA North (USA-Canada-Mexico)

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Parallel plate reactive ion etcher, cathode coupled upper Anode: Aluminum, 140mm diameter, showerhead lower Ca Location : AMERICA North (USA-Canada-Mexico)

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sn 1220 230v, 13amps, 50/60hz model 300 T1000 Quartz barrel with RF cage 2064 hours Location : AMERICA North (USA-Canada-Mexico)

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sn 1656 230v, 13 amps, 50/60hz 1731 hours Location : AMERICA North (USA-Canada-Mexico)

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Advanced Energy RFX600 13.56mhz RF power supply 1 ground and 1 powered shelf Leybold vacuum pump Location : AMERICA North (USA-Canada-Mexico)

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208v, 3 phase, 50/60hz, 20 amps Exceptional condition: Quartz barrel shows no sign of etching or use Seren 600 Location : AMERICA North (USA-Canada-Mexico)

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Downstream, Electron-Free Plasma for cleaning sensitive electronic components The Glen R3A Plasma Cleaner can Location : AMERICA North (USA-Canada-Mexico)

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12"(dia) x 20"(D) quartz barrel soft pumping and purge valving low particulate design 2ea mass flow gas inputs Location : AMERICA North (USA-Canada-Mexico)

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Specifications: Voltage: Auto-Sensing 90V - 257V Dimensions (HxWxD) 590 x 375 x 375 mm 23.2 x 14.8 x 14.8” C Location : AMERICA North (USA-Canada-Mexico)

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Vacuum chamber 340 x 400 x 450mm Door with auto unlock feature after end of process Microwave excitation 2.45G Location : AMERICA North (USA-Canada-Mexico)

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Post Etch Punch Location : EUROPE (Western and Northern)

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Retrofitted high pressure pump fully functional Year(s) : 1989 Location : EUROPE (Western and Northern)

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working width 750 mm direction left to right length 2.50 m width 1.80 m height 1.18 m power consumption 3 x 38 Year(s) : 2001 Location : EUROPE (Western and Northern)

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Envision HDI DMS-E Year(s) : 2008 Location : EUROPE (Western and Northern)

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SLR ICP Shuttle Lock ICP Inductively Coupled Plasma Etch System. PC controller. Vacuum load lock with wafer tr Location : AMERICA North (USA-Canada-Mexico)

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Accuthermo AW610 Rapid Thermal Processor. The AccuThermo AW610 is a rapid thermal processing (RTP) system, wh Location : AMERICA North (USA-Canada-Mexico)

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PILL Ätz- und Strippanlage Location : EUROPE (Western and Northern)

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Auto Etch 490 Location : AMERICA North (USA-Canada-Mexico)

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a. VCE Bellows b. MAG 7 Robot c. 2 – Chamber 4520 XLE d. Enhanced 12 gas Gas Box Location : AMERICA North (USA-Canada-Mexico)

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Mounting Bulkhead Wafer Size 200 MM Software Envision 1.52 Indexers HINE AC Box -001 Gas Box Orbital Welded Cl Location : AMERICA North (USA-Canada-Mexico)

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Mounting Bulkhead Wafer Size 200 MM Software Envision 1.52 Indexers HINE AC Box -002 Gas Box Orbital Welded Cl Location : AMERICA North (USA-Canada-Mexico)

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4420 Oxide Etch System Location : AMERICA North (USA-Canada-Mexico)

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- Downstream or Direct Plasma Asher - Microprocessor controlled - Two gas inputs plus Nitrogen input - Flow Me Location : AMERICA North (USA-Canada-Mexico)

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Microwave Asher Location : AMERICA North (USA-Canada-Mexico)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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