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Used Plasma Etcher / Asher

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1

Wafer Size Range Maximum 200 mm Process PECVD/Plasma Etch/Reactive Ion Etch Controller Type Microproces Location : AMERICA North (USA-Canada-Mexico)

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Rated Power Output 1250 Watts Chamber Construction Aluminum Chamber Size Width 14.75 in (37.47 cm) Location : AMERICA North (USA-Canada-Mexico)

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8300 Weight 36 lb (16 kg) Location : AMERICA North (USA-Canada-Mexico)

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Etcher Type Planar - Magnetron Rated Power Output 4000 Watts Reactor Center Rectangular Reactor Center Size Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Chlorine Etch Loadlock Loadloc Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Silicon Etch Bosch Process Loadlo Location : AMERICA North (USA-Canada-Mexico)

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Maximum 100 mm Process Plasma etch Controller Type Microprocessor Controller Type End Point Detection Yes Location : AMERICA North (USA-Canada-Mexico)

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Rated Power Output 300 Watts Reactor Center Cylindrical Reactor Center Size Depth 12.00 in (30.48 cm) Location : AMERICA North (USA-Canada-Mexico)

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Etcher Type Box Rated Power Output 600 Watts Reactor Center Rectangular Reactor Center Size Width 12.0 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 75 mm Maximum 200 mm Set Size 150 mm Process Nitride Etch Controller Type Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Controller Type PC Controller Type High Vacuum Pump Le Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Maximum 150 mm Process Reactive Ion Etch System Controller Type PC Controller Type Hig Location : AMERICA North (USA-Canada-Mexico)

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Panel Meters Digital External Cooling Water Cooled Accessories MKS pressure transducer--Type 122A Seven s Location : AMERICA North (USA-Canada-Mexico)

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Max Wafer: 200mm System Dimensions: 41x30x75 Configuration: Up to 200mm wafer capable, Quartz Chamber, 2 Location : AMERICA North (USA-Canada-Mexico)

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System One Stripper 105 Input Power: 200-240 Volts, 1 Phase, 50/60 HZ Location : AMERICA North (USA-Canada-Mexico)

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200 ACU Asher Serial Number: AU6A356AH Wafer Size: 200mm Location : AMERICA North (USA-Canada-Mexico)

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Ultratech UltraStep 1500 wafer stepper. Wafer Size: 150mm Can be sold used as-is or refurbished with warranty, Location : AMERICA North (USA-Canada-Mexico)

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Single chamber RIE etcher S/N 219656 150mm Configuration Location : AMERICA North (USA-Canada-Mexico)

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Etch Location : EUROPE (Western and Northern)

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Wafer Size Range Minimum 100 mm Maximum 200 mm Year(s) : 2000 Location : EUROPE (Western and Northern)

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Dry Etcher Metal Etcher Year(s) : 2007 Location : EUROPE (Western and Northern)

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MATTSON PARADIGM_SI VINTAGE AVAILABLE 2011 + 2012 Wafer size: 300mm Year(s) : 2011, 2012 Location : EUROPE (Western and Northern)

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Part No: 99-0339 Model No: A2000LL Diagram No: 99-2884 AURA 2000-LL Non-Copper CE Marked Installed Components Location : EUROPE (Western and Northern)

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4-5" wafer asher SST construction missing generator Location : EUROPE (Western and Northern)

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OEM: Lotus Configuration: Oxide (2 tanks, spin rinse dryer) Wafer 150mm Available: Q1 Year(s) : 2018 Location : EUROPE (Western and Northern)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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