Used Plasma Etcher / Asher
431 resultsTISI ID 150917-157 Manufacturer Hitachi Model M-602A Description AL Etcher Wafer Size 8" Location : ASIA (North East)
Price : On request
More detailsTISI ID 150815-60 Manufacturer AMAT Model P5000 CVD+Etch Description TEOS 3Ch, Etch 1Ch / 4C/H Wafer Size Location : ASIA (North East)
Price : On request
More detailsTISI ID 11624 Manufacturer TEL Model TE 5480 Description Plasma Reactive Ion Etch System Location : ASIA (North East)
Price : On request
More detailsTISI ID 11250 Manufacturer Mattson Model Aspen II Description Asher, 1CH(Non-ICP) Wafer Size 200mm Vintag Location : ASIA (North East)
Price : On request
More detailsMxP+ R2 Poly Etcher (3 chambers) Wafer Size 200mm The Oriental chamber not included Location : ASIA (North East)
Price : On request
More detailsTISI ID 10060 Manufacturer LAM Model TCP 9600SE Description Metal Etcher Wafer Size 200mm Location : ASIA (North East)
Price : On request
More detailsMxP Poly Etcher Wafer Size 150mm Year(s) : 1995 Location : ASIA (North East)
Price : On request
More detailsTISI ID 11036 Manufacturer LAM Model Exelan HPT -A6 (for oxide etch) Description Lam Exlean HP/HPT Oxide / Location : ASIA (North East)
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More detailsTISI ID 11042 Manufacturer LAM Model Exelan HPT- A6 for Oxide Etch Description Lam Alliance Exelan / Oxide Location : ASIA (North East)
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More detailsBrand: OSHITARI LABORATORY TISI ID 150910-125 Manufacturer OSHITARI LABORATORY Model OQWAM-2001JF Descript Location : ASIA (North East)
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More details- Plasma etch chamber - cassette to cassette, single wafer, silicon dioxide etch system with diode chamber - 2 Year(s) : 1995 Location : EUROPE (Western and Northern)
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More details- 2x high density reflected electron (HRe) process chambers with cold cathode gauges - 2x dual channel tempera Year(s) : 1995 Location : EUROPE (Western and Northern)
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More details- Wafer size: 150mm - 2x Asyst LPT2150 SMIF interface - Ultra high vacuum Endura HP platform feat. High-speed- Year(s) : 1998 Location : EUROPE (Western and Northern)
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More detailsFirst machine with serial number 50xx - Mark II mainframe containing load lock chamber with cassette to casset Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsMetal Etcher Serial # 861 Configuration 6" system for metal etch Condition/Warranty As-is, where-is Location : AMERICA North (USA-Canada-Mexico)
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More detailsMetal Etch Serial # 869 Configuration 150 mm system for etching Metal Condition/Warranty As-is, where-is Location : AMERICA North (USA-Canada-Mexico)
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More detailsRF Plasma barrel etcher Location : EUROPE (Western and Northern)
Price : On request
More detailsBrand: HOE IE Enterprise TISI ID 151012-44 Manufacturer HOE IE Enterprise Model HIMJ-0062 Description BOE Location : ASIA (North East)
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More detailsBrand: HOE IE Enterprise TISI ID 151012-45 Manufacturer HOE IE Enterprise Model HIMJ-0064 Description ITO Location : ASIA (North East)
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More detailsBrand: FSE TISI ID 151012-56 Manufacturer FSE Model IRP Description O2 Plasma (iRP) Location : ASIA (North East)
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More detailsBrand: CEE/Brewer Science CEE/Brewer Science 2100 UV-Thermal processing system, automatic cassette to casse Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrand: Hoecrst Celanese Hoecrst Celanese, Semiconductor Safety Technology Guardian burn box, with 4" ASA i Location : AMERICA North (USA-Canada-Mexico)
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More detailsBrand: EG&G/PAR EG&G/PAR optical multi-channel analyzer, 1451 plasma monitor w/1452, 512 element 2.5 mm apert Location : AMERICA North (USA-Canada-Mexico)
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More detailsXinix 1014 enpoint controller and 1104 monochrometer Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsXinix 1011B end point detector, controller only Location : AMERICA North (USA-Canada-Mexico)
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More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.