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Used Plasma Etcher / Asher

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1

Alcalic etcher, working direction right to left, Year(s) : 2004 Location : EUROPE (Western and Northern)

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Horizontal micro-etch line w/ flex transport, suitable for innerlayers. max. panel width: 650 mm, working dire Year(s) : 1999 Location : EUROPE (Western and Northern)

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Horizontal micro-etch line w/ flex transport, suitable for inner layers. Max. panel width: 650 mm, working dir Year(s) : 1999 Location : EUROPE (Western and Northern)

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Module. Max. Panel Width: 610 mm (24"). Overall machine dimensions (L x W x H): 1375 x 1820 x 1500 mm. Location : EUROPE (Western and Northern)

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panel size: 610 x 762mm (24 x 30"), Max. panel thickness: 0,8mm (0.032"), Machine Dimensions: 1760 x 1604 x 13 Year(s) : 1997 Location : EUROPE (Western and Northern)

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- Downstream or Direct Plasma Asher - Microprocessor controlled - Two gas inputs plus Nitrogen input - Flow Me Location : AMERICA North (USA-Canada-Mexico)

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PILL Ätz- und Strippanlage Location : EUROPE (Western and Northern)

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Dry-etcher/6in Year(s) : 1988 Location : ASIA (North East)

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Chamber 21x22x21 inch; O2,Ar, 600w , 13.56MHz Location : AMERICA North (USA-Canada-Mexico)

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Plasma System w/ Technics PD-IIA Location : AMERICA North (USA-Canada-Mexico)

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PLC controlled and offers real-time plain English readout of system operating parameters together with remedia Location : AMERICA North (USA-Canada-Mexico)

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– Used for photoresist stripping and surface cleaning, as well as etching silicon and its compounds – Chamber Location : AMERICA North (USA-Canada-Mexico)

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Brand: Allwin21 AW-1008 Plasma Stripper/Asher Wafer Size: 3″ – 6″ Capability Wafer Loading: 3-axis Robot Pla Location : AMERICA North (USA-Canada-Mexico)

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1

Brand: Allwin21 Corp. Allwin21 Corp. AW-B3000 Plasma Asher Wafer Size: Small~8″ Wafers Wafer Loading: Manual Location : AMERICA North (USA-Canada-Mexico)

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Brand: Allwin21 Corp. Allwin21 Corp. AW-105R Plasma Asher Wafer Size: 2″ – 6″ Capability Wafer Loading: 3-ax Location : AMERICA North (USA-Canada-Mexico)

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Brand: Allwin21 Corp. Allwin21 Corp. AW-903e TTW Plasma Etch RIE Wafer Size: 3″ – 6″ Capability Wafer Loadin Location : AMERICA North (USA-Canada-Mexico)

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Brand: Allwin21 Corp. Allwin21 Corp. AW-901e TTW Plasma Etch RIE Wafer Size: 3″ – 6″ Capability Wafer Loadin Location : AMERICA North (USA-Canada-Mexico)

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Brand: Allwin21 Corp. Allwin21 Corp. AW-903e Plasma Etch RIE Wafer Size: 3″ – 6″ Capability Wafer Loading: 3 Location : AMERICA North (USA-Canada-Mexico)

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Brand: Allwin21 Corp. Allwin21 Corp. AW-901e Plasma Etch RIE Wafer Size: 3″ – 6″ Capability Wafer Loading: 3 Location : AMERICA North (USA-Canada-Mexico)

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Brand: Allwin21 Allwin21 AW-2001R Etcher Features: Designed with III-V Production in Mind. Controller with T Location : AMERICA North (USA-Canada-Mexico)

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1

Dry Etch Location : ASIA (North East)

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1

DRY:chamber spin etcher + chemical delivery unit Year(s) : 2018 Location : ASIA (North East)

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Asher/Stripper Location : ASIA (North East)

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Post Etch Punch Location : EUROPE (Western and Northern)

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5

1994 Oxford Ionfab 300 Plus Ion Beam etching/deposition system SERIAL NUMBER 219574 THE TOOL HAD 4 MFCs, o Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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