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Used Plasma Etcher / Asher

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4-5" wafer asher SST construction missing generator Location : EUROPE (Western and Northern)

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Plasma cleaning machine Reaction chamber: Approximately W350 x D260 x H100mm View port (φ20mm) installed in Location : ASIA (North East)

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OEM: Lotus Configuration: Oxide (2 tanks, spin rinse dryer) Wafer 150mm Available: Q1 Year(s) : 2018 Location : EUROPE (Western and Northern)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Chlorine Etch Loadlock Loadloc Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Silicon Etch Bosch Process Loadlo Location : AMERICA North (USA-Canada-Mexico)

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Maximum 100 mm Process Plasma etch Controller Type Microprocessor Controller Type End Point Detection Yes Location : AMERICA North (USA-Canada-Mexico)

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SLR ICP Shuttle Lock ICP Inductively Coupled Plasma Etch System. PC controller. Vacuum load lock with wafer tr Location : AMERICA North (USA-Canada-Mexico)

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Accuthermo AW610 Rapid Thermal Processor. The AccuThermo AW610 is a rapid thermal processing (RTP) system, wh Location : AMERICA North (USA-Canada-Mexico)

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Wafer size: 6", 8" Condition: as is Year(s) : 1998 Location : EUROPE (Western and Northern)

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RF/Plasma oxide deposition tool Year(s) : 2016 Location : United States (USA)

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Manually Loaded Process Chamber with 8” (dia.) Cathode Gas Distribution Panel with 4ea Gas Channels MKS 14 Location : AMERICA North (USA-Canada-Mexico)

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XeF2 Etching System Version: Inquire Vintage: 01.06.2018 Year(s) : 2018 Location : AMERICA North (USA-Canada-Mexico)

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MILLIOS HVM, 300mm, Year(s) : 2012 Location : United States (USA)

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2000 Dry Plasma Etcher Asher, Plasma Cleaner System Location : AMERICA North (USA-Canada-Mexico)

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Plasma Etch along with Leybold Trivac D16B Vacuum Pump Location : AMERICA North (USA-Canada-Mexico)

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PX-250 Plasma Asher Etcher w/ Seren IPS R300 13.56MHz RF Location : AMERICA North (USA-Canada-Mexico)

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Configuration and Wafer Size: One chamber with one Equipe PRI ATM-104-1 robot and ESC-200 controller; Location : AMERICA North (USA-Canada-Mexico)

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Asher Year(s) : 1984 Location : ASIA (North East)

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Wafer Inspection Tool Year(s) : 2006 Location : United States (USA)

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Rated Power Output 300 Watts Reactor Center Cylindrical Reactor Center Size Depth 12.00 in (30.48 cm) Location : AMERICA North (USA-Canada-Mexico)

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Etcher Type Box Rated Power Output 600 Watts Reactor Center Rectangular Reactor Center Size Width 12.0 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 75 mm Maximum 200 mm Set Size 150 mm Process Nitride Etch Controller Type Location : AMERICA North (USA-Canada-Mexico)

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* T&c power Conversion INC 0313 RF power source * Seren MC3 automatic matching network controller * Seren RF Location : AMERICA North (USA-Canada-Mexico)

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Features ISOLATED REACTOR DESIGN REACTIVE JON ETCH REACTOR 6″ OR 8″ WAFER CAPABILITY CLOSED LOOP TEMPERATURE C Location : AMERICA North (USA-Canada-Mexico)

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ENI ACG10B 1200W Rf 13.56mhz generator 2 powered shelves 1000 SCCM N2;500 SCCM N2 Location : AMERICA North (USA-Canada-Mexico)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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