Used Plasma Etcher / Asher
493 resultsLow pressure Plasma etcher, for roll to roll casstettes, 40 KHz, 5000W, adjustable time, pressure and power. c Year(s) : 2018 Location : EUROPE (Western and Northern)
Price : On request
More detailsTable top plasma etcher suitable for two gases, vacuum pump, 230V - 50Hz Year(s) : 2003 Location : EUROPE (Western and Northern)
Price : On request
More detailsCross Section Polisher Argon Beam Milling System. Produces pristine cross sections of samples – hard, soft, or Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsRated Power Output 1000 Watts Chamber Construction Aluminum/box Chamber Size Width 13.00 in (33.02 cm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsHF-8 Plasma System LCD Display Dual Mass Flow Controllers Parallel Plate Shelf Optional Rebuilt Dual Stage Vac Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFeatures: Flexible range. Capable of 1 to 100W operation Greater stability Reproducible conditions Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details○Main specifications ・Product configuration: Atmospheric pressure plasma unit (Type FPE), plasma irradiation r Year(s) : 2015 Location : ASIA (North East)
Price : On request
More detailsDry etching system (SiO2) Year(s) : 2011 Location : ASIA (North East)
Price : On request
More detailsEtcher Type Barrel Rated Power Output 600 Watts Reactor Center Cylindrical Reactor Center Size Depth 1 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsOxide_Etch Location : ASIA (North East)
Price : On request
More detailsWafer Size Range Minimum 100 mm Maximum 200 mm Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Maximum 200 mm Process PECVD/Plasma Etch/Reactive Ion Etch Controller Type Microproces Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsRated Power Output 1250 Watts Chamber Construction Aluminum Chamber Size Width 14.75 in (37.47 cm) Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details8300 Weight 36 lb (16 kg) Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsEtching Hood Location : ASIA (North East)
Price : On request
More detailsparticle count Wafer Size 8" Location : ASIA (North East)
Price : On request
More detailsHF vapor etch Wafer Size 8" Location : ASIA (North East)
Price : On request
More detailsEtcher Type Planar - Magnetron Rated Power Output 4000 Watts Reactor Center Rectangular Reactor Center Size Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details790 Series Reactive Ion Etching / Plasma Enhanced System RIE Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsRota-Spray Etcher Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDry Etcher Metal Etcher Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsPolysilicon Dry Etch Chamber Version: 300 MM Vintage: 01.06.2012 TEL Tactras RLSA Etch Chamber TactrasTM RL Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSingle Wafer Process Single Rotometer Controlled Gas Channel Multi-Step Process Cycle Capability Programmable Year(s) : 1987 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMATTSON PARADIGM_SI VINTAGE AVAILABLE 2011 + 2012 Wafer size: 300mm Year(s) : 2011, 2012 Location : EUROPE (Western and Northern)
Price : On request
More detailsPart No: 99-0339 Model No: A2000LL Diagram No: 99-2884 AURA 2000-LL Non-Copper CE Marked Installed Components Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.