Used Plasma Etcher / Asher
493 resultsAluminum Chamber for Up To 5″ Wafers Single Gas Input Optional Dual Gas Control Box is Available Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPLASMA ASHER ALUMINUM CHAMBER FOR CASSETTES OF 4″ WAFERS ( AND SMALLER) Location : AMERICA North (USA-Canada-Mexico)
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More detailsULVAC - XeF2 Etch Release FRE-200E Equipment Details: RF Power supply. Voltage: 208V Frequency: 60Hz Phase, Wi Year(s) : 2014 Location : EUROPE (Western and Northern)
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More detailsPlasma Etcher Model TE5000S 150MM Location : EUROPE (Western and Northern)
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More detailsDry Etching: CDE Year(s) : 1994 Location : ASIA (North East)
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More detailsDry etcher Model TCE3822 Location : ASIA (North East)
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More detailsMax Wafer: 200mm System Dimensions: 41x30x75 Configuration: Up to 200mm wafer capable, Quartz Chamber, 2 Location : AMERICA North (USA-Canada-Mexico)
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More detailsFuji sFAB-D automated odd-form inserter (2017) Multi-purpose automated fabrication machine, flexibly supports Year(s) : 2017 Location : AMERICA North (USA-Canada-Mexico)
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More detailsALUMINUM CHAMBER ID 6X6X10″ WIDE REBUILT DIRECT DRIVE PUMP AVAILABLE FOR ADDITIONAL FEE FOMBLIN/KRYTOX PREP (I Location : AMERICA North (USA-Canada-Mexico)
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More detailsMetal Etch Year(s) : 2000 Location : United States (USA)
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More detailsHIO process Year(s) : 1999 Location : United States (USA)
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More detailsEtch Location : EUROPE (Western and Northern)
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More details- Shelves, controller, and internal MFCs - RF Generator - Removable Shelves - Vacuum Pump Excellent Conditio Location : AMERICA North (USA-Canada-Mexico)
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More detailsFeric Chloride etch line and stripper, max panel width 1320mm, min/max panel thickness 0.3/2.0mm, work directi Year(s) : 2014 Location : EUROPE (Western and Northern)
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More detailschamber dimensions 16 x16"x18" 2 Porter MFC's ENI ACG-3B 600w 13.56mhz Rf power supply Leybold D65BCS vacuum p Location : AMERICA North (USA-Canada-Mexico)
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More detailsVacuum chamber 340 x 400 x 450mm Door with auto unlock feature after end of process Microwave excitation 2.45G Location : AMERICA North (USA-Canada-Mexico)
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More detailsENI ACG10B 1200W Rf 13.56mhz generator 2 powered shelves Porter Masss flow controllers: 1000 SCCM N2 500 SCCM Location : AMERICA North (USA-Canada-Mexico)
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More detailsRIE 10 NR – SAMCO RIE 10NR Reactive Ion Etch System | Dry Etching System / Tool with Thermo Electron Thrmoflex Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPM 119 RF GENERATOR (500 WATTS) 10″ DIAM X 20″DEEP QUARTZ CHAMBER 3 GAS CAPABLILITY INCLUDES FOMBLIN PREPPED D Location : AMERICA North (USA-Canada-Mexico)
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More details750 WATT GENERATOR, 3 GAS CAPABILITY 10X20″ QUARTZ BARREL INCLUDES FOMBLIN PREPPED DIRECT DRIVE VACUUM PUMP DO Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTABLE TOP REACTIVE ION ETCHER ONE WAFER UP TO 6″ DIAMETER PER CYCLE TURBO PUMPED MICROPROCESSOR CONTROLLED REB Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Set Size 200 mm Number of Chambers 1 Process Capabil Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
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More details- Hine indexer - 1 chamber Automation online component: SECS/GEM - No fixed gap chamber - EPD: Verity EP200Mmd Location : ASIA (North East)
Price : On request
More detailsOdd Form Placer ONLY 930.00 Hours. IN LIKE NEW CONDITION Daily Maintenance performed while under operation App Year(s) : 2018 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsEtcher Location : AMERICA North (USA-Canada-Mexico)
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More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XＳ5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.