Used Plasma Etcher / Asher
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ModelCORONA RDT 1210A Description Wafer Size8 Year(s) : 2008 Location : ASIA (North East)
Price : On request
More detailsModel SP-W621 Spray etching system （AL） Year(s) : 1989 Location : ASIA (North East)
Price : On request
More detailsDry etching system (Mo) Year(s) : 1989 Location : ASIA (North East)
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More detailsManufacturer TOYOKO KAGAKU Wet etching system （SiN） Year(s) : 2005 Location : ASIA (North East)
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More detailsBrand: YOKOGAWA OZ3000 Dry Etch Location : ASIA (North East)
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More detailsBrand: TYK Etching Hood Wafer Size 8" Location : ASIA (North East)
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More detailsDry etching system (Poly Si) Year(s) : 1984 Location : ASIA (North East)
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More detailsBrand: TOKYO OHKA Dry etching system (SiN) Year(s) : 1984 Location : ASIA (North East)
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More detailsBrand: Plazma Systems Resist asher （tube type） Year(s) : 1982 Location : ASIA (North East)
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More detailsBrand: DES-212 Low temperature asher Lead Time Immediately Year(s) : 1981 Location : ASIA (North East)
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More detailsBrand: Plazma Systems Resist asher （tube type） Lead Time Immediately Year(s) : 1983 Location : ASIA (North East)
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More detailsPhotoresist Stripper/Asher/Etcher System Location : AMERICA North (USA-Canada-Mexico)
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More detailsBarrel Photoresist Stripper/Asher/Etcher System Location : ASIA (North East)
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More detailsBrand: ASM Plasma CVD(SiO2) Wafer Size 200mm Location : ASIA (North East)
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More detailsWafer Size Range Minimum 200 mm Set Size 200 mm Number of Chambers 2 Process Capabilities 2x MXP Nar Location : EUROPE (Western and Northern)
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More detailsWafer Size Range Set Size 200 mm Power Requirements 208 V 80.0 A 50/60 Hz 3 Phase CE Marked Y Year(s) : 1999 Location : EUROPE (Western and Northern)
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More detailsPlasma Etch Wafer Size Range Minimum 150 mm Maximum 150 mm Set Size 150 mm Other Information proc Year(s) : 1995 Location : EUROPE (Western and Northern)
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More detailsPlasma Etch Wafer Size Range Minimum 150 mm Maximum 150 mm Set Size 150 mm Other Information proc Year(s) : 1995 Location : EUROPE (Western and Northern)
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More detailsEtcher Type Box Rated Power Output 600 Watts Reactor Center Rectangular Reactor Center Size Width 12.00 in (3 Location : AMERICA North (USA-Canada-Mexico)
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More detailsEtcher Type Box Rated Power Output 5000 Watts Reactor Center Rectangular Reactor Center Size Width 30.00 in ( Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Process DRIE PECVD Controller Type PC Controller Type End Point Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Set Size 200 mm Number of Chambers 1 Process Capabil Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
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More detailsRated Power Output 1000 Watts Chamber Construction Aluminum/box Chamber Size Width 13.00 in (33.02 cm Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Maximum 200 mm Process PECVD/Plasma Etch/Reactive Ion Etch Controller Type Microproces Location : AMERICA North (USA-Canada-Mexico)
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More detailsRated Power Output 1250 Watts Chamber Construction Aluminum Chamber Size Width 14.75 in (37.47 cm) Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XＳ5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.