Used Plasma Etcher / Asher
390 resultsCommon Features of All 7500 Series Systems • Compact benchtop design permits easy integration into existing la Year(s) : 2010 Location : EUROPE (Western and Northern)
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More detailsPlasma Etch System: It uses a plasma-based process to selectively remove materials from the wafer surface, suc Location : AMERICA North (USA-Canada-Mexico)
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More detailsPECVD 80+ SiO2 Dep Non-functional tool but can be repaired (requires Silane MFC) Designed for 4” wafers but ca Location : EUROPE (Western and Northern)
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More detailsDual Chamber R.I.E. Version: 200 mm Vintage: 01.06.1994 includes: -LH and RH chambers are RIE with adjustable Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)
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More detailsDual Chamber RIE / Plasma etch Version: 200 mm Vintage: 01.04.1999 The LH Chamber is Standard, the RH chamber Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
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More detailsLam Research 9600SE Rainbow Metal Etch Tool Rainbow Configuration Includes Post-Etch PR Strip Chamber Envision Location : AMERICA North (USA-Canada-Mexico)
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More detailsFully programmable, stepper motor driven, electrohydraulic pump for viscosities from 1cp-3,000cp. Repeatabilit Location : AMERICA North (USA-Canada-Mexico)
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More detailsSingle Process Chamber with SLR (Shuttle Lock Transfer) Load Lock Manual Load with Load Lock Handling Currentl Location : AMERICA North (USA-Canada-Mexico)
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More detailsBRANSON/IPC S2005-11020 Reactor Center with 10” (i.d.) X 20” (h) Quartz Chamber S2000C Controller with 2ea Rot Location : AMERICA North (USA-Canada-Mexico)
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More detailsWAFER SIZE 8,12 4 Chambers Year(s) : 2007 Location : EUROPE (Western and Northern)
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More detailsWAFER SIZE 8,12 1 chamber Year(s) : 2006 Location : EUROPE (Western and Northern)
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More detailsLast knows condition: operational, GUI PC and CTC PC in e-rack are not working. Application: deep silicon etc Year(s) : 2012 Location : EUROPE (Western and Northern)
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More detailsApplied Materials Precision 5000 (AMAT P5000) cluster tool and all spare parts. 4-inch/100mm wafer kit, pump Location : EUROPE (Western and Northern)
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More detailsDeep Silicon Etcher Version: 4 inch Vintage: 01.06.1998 Plasma-Therm SLR 770 ICP (Deep Silicon Etcher) single Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
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More detailsDeep Silicon Etcher Version: 4,6 and 8 inch Vintage: 01.06.2012 Plasma-Therm Versaline DSE-III (Deep Silicon Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
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More detailsThe Oxford Plasmalab 100 is a modular plasma processing system. It can be configured to carry out Reactive I Location : AMERICA North (USA-Canada-Mexico)
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More detailsWAFER SIZE 6,8 Year(s) : 2007 Location : EUROPE (Western and Northern)
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More detailsThis system was only used in an R&D Lab for O2 Plasma clean of medical device. It is in excellent condition. Year(s) : 2000 Location : EUROPE (Western and Northern)
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More detailsMicro etch line, conveyor recently renewed, input, micro etch, rinse, dryer, output. Year 2006. Year(s) : 2006 Location : EUROPE (Western and Northern)
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More detailsDry Etcher Version: 200 mm De-installed from working condition and warehoused. Please refer to the attached p Location : AMERICA North (USA-Canada-Mexico)
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More details4 chambers Wafer Size 8,12 Year(s) : 2008 Location : EUROPE (Western and Northern)
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More detailsDNS 80A SK-W80A-AVO WAFER SIZE 8 Year(s) : 2001 Location : EUROPE (Western and Northern)
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More detailsworking width 1320 mm not included: chlorine rgeneration station Year(s) : 2014 Location : EUROPE (Western and Northern)
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More detailsREACTIVE ION ETCHER (RIE) Location : AMERICA North (USA-Canada-Mexico)
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More details14″ DIAMETER CHAMBER X 16″ LONG (3 GAS CAPABILITY) FOR UP TO 12″ OR 300 MM WAFERS Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.