TEL, Tokyo Electron Tactras RLSA (Chamber)

Polysilicon Dry Etch Chamber
Version: 300 MM
Vintage: 01.06.2012

TEL Tactras RLSA Etch Chamber TactrasTM RLSATM provides an innovative,
new plasma technology that TEL has been optimizing for years.
Microwave technology provides high selectivity
and excellent etch- profile control with low electron temperature
of the radical-rich process by diffusion plasma. In addition,
the output microwave stability, high repeatability,
and process operation range has been improved
with microwave broadband technology which enables precise control
of the radical/ion ratio for high profile controllability.
TactrasTM RLSATM has a high market share for a critical application
in leading-edge logic devices. RLSA Chamber information :ESC for wafer
with Dual He Cooling Nihon Koshuha Microwave Generator /
Model is MKS 050B04C-OSC-V Turbo Pump:SHIMADZU /
Model is FT2301D Generator Details:Top MKS-050B04 PS-V
Bottom Daihen RGA-20C
Gas Box Configuration : 1 N2 2 TSA 3 Ar 4 H2 5 NF3 6 SiH4