Nanometrics

Nanometrics AFT 210

* EQP-00848-SI & EQP-00870-SI (has auto loader as pictured below)
* Nanometrics 210
* Film Measurement System
* Stage - dual 4" wafers - larger stage can be supplied
* Range of Thicknesses: 100 to 500,000 angstroms,
* Spot Size: 50 um with 5x objective, 25 um with 10x
objective, 6.5 um with 40x objective
* System includes an Olympus M10x and M40x objective.
* Optional Objectives are Olympus M5X and M100X
* Film Types: Oxide on Silicon; Nitride on Silicon; Negative
Resist on Silicon; Polysilicon on Oxide; Negative Resist on
Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist
on Silicon; Positive Resist on Oxide
* Reflectance Mode
* Thick Films, Reproducibility: 5A ± 5% depending upon the
film type
* Typical Measurement Time: 2.5 seconds.