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Nikon Nikon NSR-1755i7 Stepper

Ref : Lot: 38
Condition : Used
Manufacturer : Nikon
Model : Nikon NSR-1755i7 Stepper
Year(s) : -
Quantity : 1
Location : Seller or machines location:
South Korea

Nikon NSR-1755i7 Stepper

Type: i-line Stepper
Version: 4 inch-8 inch
Condition: excellent
Vintage: Jun 1992
Sale condition: as is, where is
Quantity: 1
Comments:
-Still installed in the fab.
-Shut down and powered off.
-It can be inspected by appointment.
-The equipment is in excellent condition, with no missing parts.
-The equipment was lightly used in an R and D environment for around 2-3 years. -The equipment ran 4 inch Sapphire wafers.
-5 INCH RETICLE
-5:1 reduction ratio
-17.5 Field
-O.45 Resolution, NA = 0.5
-Global alignment 0.18 um
-The equipment was completely refurbished and converted for use with 4 inch Sapphire wafer in June 2010.
-The equipment can be converted to run up to 8-inch wafers by changing out the wafer chuck.


Nikon NSR-1755i7A - Specification
No. Item Specification
1 Resolution 0,50 µm
2 Lens Distortion (including magnification error) Within ± 0.07 µm
3 Magnification Control Within ± 0.03 µm
4 Maximum Exposure Area Within 24.74 mm dia.
17.5 mm x 17.5 mm to
13.41 mm x 20.14 mm
(hori.) (ver.)
5 Reticle Bind Setting Accuracy + 0.4 + 0.8 mm (on reticle)
6 Exposure Power 600 mW/cm3 or more
7 Integrated Exposure Stability Within ± 1.4% (30mJ/cm2 or more)
8 Illumination Uniformity Within ±1.5%
9 Reticle Rotation Absolute Value within
±0.02 µm of target value
Repeatability within
0.02µm
10 Focus Calibration Repeatability Within 0.15 µm (3 ơ)
11 Alignment Accuracy WGA X+3 ơ ≤0.18 µm
EGA X+3 ơ ≤0.11 µm
12 Array Orthogonality Within ± 0.2 sec
13 Stepping Precision Within 0.8 µm (3 ơ)
14 Stepping Rate 11 sec or less (100mm)
20 sec or less (125mm)
28 sec or less (150mm)
15 Throughput WGA
21 min 00 sec or less (125mm)
21 min 00 sec or less (125mm)
22 min 40 sec or less (150mm)
EGA
21 min 00 sec or less (100mm)
21 min 15 sec or less (125mm)
24 min 50 sec or less (150mm)
16 Reticle Pre alignment Accuracy Within ± 2 mm
17 Operational Test Wafer transfer system
Success rate: 99% or more
Reticle transfer system
Success rate: 100%
18 Interchangeability ±0.12 µm (95% or more)

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