Oem 470S SRD High Performance Spin Rinse Dryer Wafer Cleaner

OEM Group 470S SRD High Performance Spin Rinse Dryer Wafer Cleaner.
The SRD is a 25 wafer, batch size, single or dual chamber tool.
This proven design has demonstrated uptime of 95%.
Introduced in 1979, over 25,000 SRD units have shipped worldwide.
Spray on axis orientation allows uniform spray onto the wafers.
Clean / Rinse built-in resistivity monitoring assures an automatic and
reliable clean; the process chamber is cleaned with the product;
quick ramp S model brushless DC motor provides economy and efficiency.
Dry centrifugal drying, coupled with heated nitrogen and
a lowpressure nitrogen purge through a heated process chamber.
Flexible Fast easy to change rotors for simple re-configuration to
match any array of applications’ wafers.
Currently configured with single bolt rotor for 6" x 6" squares.
120V, 50/60Hz, 15A