Olympus MX61A-F

MX61A-F frame configured for brightfield and darkfield observation
Stainless steel table with granite vibration isolation platform
Ludl motorized XY stage with 6x6 travel and MAC 5000 controller
(microscope may be upgraded with 8x8 motorized or manual stage)
Trinocular viewing head with U-TV1X-2 adaptor, U-CMAD3 C-mount and DP20 camera
U-LH100L-3 12v 100w lamphouse
WH-10X widefield eyepieces
6 place motorized nosepiece

Objectives:
M Plan Fl N 5x/0.15
BDM Plan FL N 10x/0.30
BDM Plan FL N 20x/0.45
BDM Plan FL N 50x/0.80M
Plan FL N 100x/0.90
BD248nm UV objective: MApo 248 100x/0.90
U-LH100-3 100w halogen lamphouse
U-AFA2M-DUV laser autofocus module with BX-UCB controller and U-HSTR2 keypad
U-UVF248A motorized deep UV observation module 248nm supports resolutions u to 0.08um
INCLUDES: U-UVF248IM observation tube, UXM80E mercury/xenon burner
U-UVF248LBM light source box
U-HXT power supply
U-UVF2FB light guide
BX-UCB control box
UV M Apo 100x objective for 248nm UV light
PC WITH MXBSW CONTROL SOFTWARE

This specially designed module provides bright and
high contrast deep ultraviolet real time images for
detailed semiconductor and nano-fabrication inspections

The optical system optimized for 248 nm provides resolutions down
to 80nm, two times better than that available with the visible light.
The 248 ±4nm imaging band is corrected to prevent chromatic aberrations.
This technique makes it possible to observe both high-contrast and
high-resolution features without preprocessing.

Common applications for DUV observation include detailed inspections of
semiconductor patterns, gap and pole identification on magnetic heads,
and microlithography.