Oxford PlasmaPro 100 Cobra with Cobra 300 ICP

Oxford PlasmaPro 100 Cobra consisting of:
- Cobra300 3kW ICP plasma etch source
- Chamber and pump down pipe Heating Kit
- Compact single wafer loadlock
- Electrostatic Shield for ICP plasma source
- Cryo-cooled / electrically-heated etch lower electrode kit
- Horiba Laser End Point Detector, 670nm
- RF 300W generator & amu match for ETCH
- Wafer clamping and helium backing kit
- 100mT CM gauge
- Computer with 22" monitor
- Pfeiffer HiPace 80 turbo pump for loadlock
- Adixen ATH1600MT turbo, apc & heated backing valve kit
- Adixen ACP15G dry pump
- Pfeiffer A124H ELT pump
- 415V, 50/60Hz 3phase supply configuration
- Standard Gas Pod externally mounted (8 lines max)