Plasmatherm Therm 790

Model: Plasma-Therm
Dual Chamber
PECVD & RIE System

Used
Details:
The 790 platform
offered in both RIE and PECVD configurations
has been field demonstrated
to have low maintenance requirements
and is easily operated in R&D
through high production environments
Features:
Non-loadlock system
RFPP - RF5S RF power supply
with matching network
Windows based operating system
Watlow 945 controller
Unit includes disconnect box
HPS smart exhaust throttle valve
Specifications:
Substrate electrode is water cooled
Gas distribution panel consisting of
6 MFC's per process side