Rudolph Research FE-III, Focus Ellipsometer

Brand: Rudolph Research
Model: FE-III
FOCUS ELLIPSOMETER

Specifications
• Used
• Class 1 filtered wafer environment
• Advanced measurement capability
• Simultaneous "multi-angle" of incidence measurements
• No order ambiguity for transparent films
• Increased parameter solving
• System intensity is automatically controlled to compensate
for the varying intensity of different samples
• 4 - 8" wafer handling
• Small spot (12 x 24µm)
• Single measurement is performed within 1/10th of a second
• Advanced measurement capabilities:
• Silicon dioxide: 0 - 5 microns
• Silicon nitride: 0 - 8000Å
• PhotoResist: 0 - 3 microns