Semitool SST-C-642-250

Can be sold As Is or can be configured to meet your requirements
Batch Wafer Processing
Etch/Clean - Wet Processing
Currently Configured for: 200mm
6 tanks, 4 of them heated,
2 chambers.

Tool Configuration
Model: Semitool SST-C-642-250 Solvent Spray System
Chamber Type: Dual-stack, 8-pump configuration
Process Type: Solvent resist strip / lift-off / clean
Wafer Size: Configured for 200 mm (150 mm carriers optional)
Tank & Pump Configuration:
Tank 1 – Pump 1: ACT 412 (not used)
Tank 2 – Pump 2: N-Methyl-2-pyrrolidone (NMP)
Tank 3 – Pump 3: ACT 412 (not used)
Tank 4 – Pump 4: N-Methyl-2-pyrrolidone (NMP)
Tank 5 – Pumps 5 & 7: Acetone
Tank 6 – Pumps 6 & 8: Isopropyl Alcohol (IPA)
Typical Process Sequence: Hot NMP strip → Acetone rinse → IPA final rinse/dry
Construction: Stainless-steel solvent tanks, explosion-proof enclosures, nitrogen purge
Facilities: CDA, N2, exhaust, drain, 208 V 3-phase power
Notes: Two ACT 412 tanks currently idle; may be re-purposed
for additional solvents or rinses. No acid tanks installed.