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Used Lithography & Photoresist

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<b>Brand: Fusion Model: M150PC Year: 1994 <u>UV Stablizer </b></u> <b>Details:</b> used Wafter Size : 4 inch Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)

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Litho: exposure Year(s) : 2004 Location : ASIA (North East)

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Balzers BAK 600 CE Evaporator (135) , E-gun, Cryosystem, Halogen Heater Location : EUROPE (Western and Northern)

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Canon PLA - 501 FA Mask Aligner (104) , 3" wafer Location : EUROPE (Western and Northern)

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Canon PLA - 501 FA Mask Aligner (103) , 3" wafer Location : EUROPE (Western and Northern)

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Planar Pulsar Chemical Resist/Strip serial 52700-6306 Year(s) : 1993 Location : AMERICA North (USA-Canada-Mexico)

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Automated Resist Processing System Spray Resist Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)

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Configuration: Canon Part# Y60-1095-R00 XY wafer stage, Fully refurbished Suitable for Canon FPA-3000 i5 stepp Location : AMERICA North (USA-Canada-Mexico)

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Wafer: 8" , 6" or 4" (for other sizes, please inquire) Throughput: 85wph (60 shot) 22mm ( 8” Wafer) Throughp Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)

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MTI Flexifab Photoresist Track * Process configuration is Send/Develop/Bake/Bake/Receive. * Capable of handl Location : AMERICA North (USA-Canada-Mexico)

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MTI Multifab Develop or Coat Track * Process configuration is Send, Develop or Coat, Bake thenReceive. * Dua Location : AMERICA North (USA-Canada-Mexico)

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MTI Multifab Photoresist Track * Process configuration is Send/Coat/Receive. * Hot Plate (Bakes) can be adde Location : AMERICA North (USA-Canada-Mexico)

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MTI Flexifab Photoresist Develop Track (2) module configuration : Send - Receive Elevator / Develop Module Location : AMERICA North (USA-Canada-Mexico)

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MTI Flexifab Photoresist Track * Process configuration is Send/Prime/chill/coat/Bake/Receive. * Capable of Location : AMERICA North (USA-Canada-Mexico)

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MTI Flexifab Photoresist Coater module configuration : Send/Coat/Hot Plate/Receive Set up for 150mm wafers - Location : AMERICA North (USA-Canada-Mexico)

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MTI Flexifab Photoresist Track * Process configuration is Send/Coat/Bake/Bake/Receive. * Capable of handlin Location : AMERICA North (USA-Canada-Mexico)

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IDI Cybor HVP M650 Photoresist pumps Location : AMERICA North (USA-Canada-Mexico)

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IDI HVP 600 Pump * IDI purchased the Cybor line of pumps * Hi Viscosity Pump * This was predecessor to the ID Location : AMERICA North (USA-Canada-Mexico)

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IDI 300 pump cabinet * System is "Brand New" - Never used * 4ea. IDI model 313-M8L2-S pumps - "Brand New" * 1 Location : AMERICA North (USA-Canada-Mexico)

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IDI 300 Controller (IDI 300 Controller) * (1) IDI controller can hold up to (4) PCB. * Each PCB can control Location : AMERICA North (USA-Canada-Mexico)

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IDI 200 Photoresist Cabinet * 2ea. IDI model 200 resist pumps (2 outputs) * 2ea. IDI model 200 solvent pumps Location : AMERICA North (USA-Canada-Mexico)

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EFD Valvemate 7000 Controller Location : AMERICA North (USA-Canada-Mexico)

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EFD 1500 XL Liquid / Epoxy Adhesive Dispenser Location : AMERICA North (USA-Canada-Mexico)

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Brand: Sitek Sitek Developer Spray enclosure The enclosures are brand new and customizied for the MTI Multif Location : AMERICA North (USA-Canada-Mexico)

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Brand: Sitek Sitek Developer Spray enclosure for MTI Multifabs (Developer Spray enclosure) Location : AMERICA North (USA-Canada-Mexico)

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You can find used Lithography & Photoresist on Wotol

The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,

The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000,  PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U,  M150PC,  BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640,  MJB-55,

HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment 
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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