Applied Materials Centura HDP

Wafer Size Range
Minimum 200 mm
Number of Chambers 3
Process Capabilities High Density Plasma Deposition
Software Revision Level WIN 10
Process Gases SiH4, NF3, He, Argon, O2
Power Requirements 208 V 100.0 A 50/60 Hz 3 Phase
CE Marked YES
Refurbished YES
Condition Good

Software: Win 10
OR 4000 WTM Controller
3x ENI Generator Racks
Chiller INR-498-011D
2x Remote Monitor
High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F
Software: Win 10
OR 4000 WTM Controller
3x ENI Generator Racks, Chiller INR-498-011D
2x Remote Monitor
High Density Plasma Process
Process Chambers: A,B,C
Orienter chamber F
System: 1x Mainframe
3x process chamber
1x Controller Rack
1x Chiller
3x ENI Generator Racks (Converted to separate water supply each Generator)
1x Controller Rack
x Chiller
3x ENI Generator Racks (Converted to separate water supply each Generator)
AMAT Vita/Delphin Controller
Tool will be sold without Software