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Used CVD Equipment

255 results
1

200mm, s/n: 97-46-5419 Tool ID: HDPO-A01 Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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CVD: MOCVD/4in. Year(s) : 2009, 2010 Location : ASIA (North East)

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1

CVD: MOCVD/4in. Year(s) : 2010 Location : ASIA (North East)

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1

CVD: MOCVD(GaAs)/4in. Year(s) : 1999, 2001 Location : ASIA (North East)

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1

Producer SE, 300mm Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)

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1

2008 vintage IQ Mask Aligner Year(s) : 2008 Location : EUROPE (Western and Northern)

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1

pvd: Sputter/6in. Location : ASIA (North East)

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1

PVD Year(s) : 2018 Location : ASIA (North East)

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1

pvd: Sputter/6in. Location : ASIA (North East)

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1

pvd: Sputter/6in. Location : ASIA (North East)

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1

CVD: APCVD/6in Year(s) : 2000 Location : ASIA (North East)

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1

Stepper Location : ASIA (North East)

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1

Pvd: Sputter/6in Location : ASIA (North East)

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7

Software Ver: B6.50 CB1 Amps: 300A Vita Controller Flow Point Model: Nano Valve Gas Panel Type: Configurable W Year(s) : 2006 Location : EUROPE (Western and Northern)

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1

104 CVD Tools in the Line, Like New condition. Year(s) : 2021 Location : EUROPE (Western and Northern)

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1

Applied Materials 5200 Centura - WCVD Wafersize: 150mm 200mm convertible: Yes Chambers/configuration: 2 WxZ de Year(s) : 1996 Location : EUROPE (Western and Northern)

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1

Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 mm Number of Chambers 3 Process Capabi Year(s) : 2012 Location : EUROPE (Western and Northern)

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1

TEL Trias Ti/TiN System TEL MF CVD314-02 WAFER SIZE 12 Year(s) : 2008 Location : EUROPE (Western and Northern)

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1

Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 150 mm Number of Cassette Platforms 24 Rob Location : EUROPE (Western and Northern)

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1

Chemical Vapor Deposition Equipment 300mm Year(s) : 2017 Location : AMERICA North (USA-Canada-Mexico)

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1

CVD: MOCVD(SIC)/4in. Year(s) : 2014 Location : ASIA (North East)

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1

CVD: MOCVD/4in Year(s) : 2010 Location : ASIA (North East)

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1

CVD: MOCVD Year(s) : 2004 Location : ASIA (North East)

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1

Features: - thin film deposition - encapsulation - coating - eg SiO 2 , SiN x , SiON x , a Si - up to 200 mm w Year(s) : 2015 Location : EUROPE (Western and Northern)

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1

CVD: MOCVD/4in. Location : ASIA (North East)

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You can find used  CVD Equipment on Wotol

The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson

The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG

HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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