Used CVD Equipment
257 resultsCVD: MOCVD/4in Year(s) : 2009, 2010 Location : ASIA (North East)
Price : On request
More detailsAPPLIED MATERIALS AMAT 5200 CENTURA II consisting of: - Model: 5200 Centura II - 2 DxZ Chambers - SBC System C Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsOXFORD PLASMALAB 100 PECVD consisting of: - Model: Plasmalab 100 PECVD - Plasmalab 100 PECVD Main System - Dua Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsManufacturer Noevllus DKN config Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD Model Vector Express Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD/PVD Location : EUROPE (Western and Northern)
Price : On request
More detailsTool Status: Connected Wafer Size: 300 mm Asset Description: DESPATCH Bake-out Cabinet Oven CIM: NONE Proc Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsSpecification : Wafer Size: 200mm Robot: HP(buffer and Transfer) Loadlock: Narrow Bod Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer size: 300mm Process: CVD Year(s) : 2010 Location : EUROPE (Western and Northern)
Price : On request
More detailsWAFER SIZE 200mm Complete As is TZ4000 TEOS Year(s) : 1994 Location : EUROPE (Western and Northern)
Price : On request
More detailsTEL Alpha 8S-Z Pyro Main Controller: Waves Version 2.48 R008 200mm Gas : N2/02/H2/HCL Heater: VOS-40-107 Twin Year(s) : 1999 Location : EUROPE (Western and Northern)
Price : On request
More detailsTEOS APCVD FOR USG / PSG AND BPSG Version: 150 mm WJ-TEOS999-3.5 WJ-996-11.4 Sorbios semozon 250.3 3x IVAs wit Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsManufacturer KDF Si Doped Reactive 974i KDF (includes Four std. 24.4" planar cathodes) Water Pump CTI MDL 550 Year(s) : 2022 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Minimum 200 mm Number of Chambers 3 Process Capabilities High Density Plasma Deposition Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsVacuum System Cryo Pumped Vacuum System Two CTI OnBoard 8 Cryopumps Leybold B65 roughing pump Load Lock Incl Year(s) : 1995 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• 3-station process module (P1, P2, P3) • 5 kW pulsed DC power supply • P3 dedicated to ITO or other TCF Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsProcess configuration 500 deg c under the injectors Process cooling water MKS type throttle vavle with control Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Minimum 200 mm Maximum 200 mm Condition Good Exterior Dimensions Width 61.811 Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsThe tool was recently dismantled and is stored in a warehouse Location : EUROPE (Western and Northern)
Price : On request
More detailsSACVD (Chemical Vapor Deposition) Deposition Equipment Equipment details: Date of Manufacture: 2006 Currently Year(s) : 2006 Location : EUROPE (Western and Northern)
Price : On request
More detailsProcess: HTO Vintage: 2006 Year(s) : 2006 Location : EUROPE (Western and Northern)
Price : On request
More detailsProcess: HTO Vintage: 2015 Year(s) : 2015 Location : EUROPE (Western and Northern)
Price : On request
More detailsKokusai Quixace Ultimate, 300mm, DJ-1236VN-DF Year(s) : 2015 Location : EUROPE (Western and Northern)
Price : On request
More detailsIncluding all Accessories, Vacuum pump etc Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsWAFER SIZE 6" Year(s) : 1996 Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.