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Used CVD Equipment

258 results
1

Wafer size: 12" Process: Etch OCD Measuring Location : EUROPE (Western and Northern)

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WAFER SIZE 300mm Year(s) : 2009 Location : EUROPE (Western and Northern)

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Three chamber delta Dhl but is configured for 6 inch (this is not upgradable to 8”). The delta offers two Location : EUROPE (Western and Northern)

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1

Wafer size: 300mm Process: SiCoNi RPS: FI20620-1 x2ea RF Generator: APRX3013 AE Location : EUROPE (Western and Northern)

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1

CVD Tool with 4 Chambers 2 Chambers Etch, 2 Chambers CVD SILAN Location : EUROPE (Western and Northern)

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WAFER SIZE 6 Year(s) : 1995 Location : EUROPE (Western and Northern)

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1

CVD: PECVD Location : ASIA (North East)

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cvd: LPCVD/6inch Year(s) : 2018 Location : ASIA (North East)

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CVD: MOCVD Year(s) : 2012 Location : ASIA (North East)

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pvd: Sputter/6in Location : ASIA (North East)

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CVD: W-CVD/8inch Year(s) : 1999 Location : ASIA (North East)

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Ion Implanter Year(s) : 2016 Location : ASIA (North East)

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Ion Implanter Year(s) : 2006 Location : ASIA (North East)

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CVD Year(s) : 2007 Location : ASIA (North East)

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Sput: Deposition system Year(s) : 2008 Location : ASIA (North East)

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spu: Vacuum Deposition Equipment Year(s) : 2013 Location : ASIA (North East)

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CVD Year(s) : 2007 Location : ASIA (North East)

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1

CVD: MOCVD Year(s) : 2020 Location : ASIA (North East)

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1

CVD Year(s) : 2007 Location : ASIA (North East)

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1

CVD Year(s) : 2008 Location : ASIA (North East)

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1

Furnace:/ALOY Location : ASIA (North East)

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1

Furnace: Diffusion Location : ASIA (North East)

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1

CVD Year(s) : 2008 Location : ASIA (North East)

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cvd: LPCVD/DPLOY Location : ASIA (North East)

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1

coat: TRACK(1C3D) Location : ASIA (North East)

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You can find used  CVD Equipment on Wotol

The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson

The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG

HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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