Used CVD Equipment
258 resultsAMAT Centura RTP WAFER SIZE 200mm 2x XE chambers Year(s) : 1999 Location : EUROPE (Western and Northern)
Price : On request
More details4 x DLH Chambers Silane Base oem 12b rf generators Location : EUROPE (Western and Northern)
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More detailsWafer 300mm No HDD In storage 1 Chamber Advanced Ashable Hard Mask process ( AHM ) "Designed to address the c Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsLED 50/100mm As is Excellent condition Working condition before removing from production line Deinstalled and Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD Location : South Korea
Price : On request
More detailsCVD: MOCVD(GaAs)/4in. Year(s) : 1999, 2001 Location : South Korea
Price : On request
More details2008 vintage IQ Mask Aligner Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More detailspvd: Sputter/6in. Location : South Korea
Price : On request
More detailsPVD Year(s) : 2018 Location : South Korea
Price : On request
More detailspvd: Sputter/6in. Location : South Korea
Price : On request
More detailspvd: Sputter/6in. Location : South Korea
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More detailsStepper Location : South Korea
Price : On request
More detailsSoftware Ver: B6.50 CB1 Amps: 300A Vita Controller Flow Point Model: Nano Valve Gas Panel Type: Configurable W Year(s) : 2006 Location : EUROPE (Western and Northern)
Price : On request
More detailsApplied Materials 5200 Centura - WCVD Wafersize: 150mm 200mm convertible: Yes Chambers/configuration: 2 WxZ de Year(s) : 1996 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 mm Number of Chambers 3 Process Capabi Year(s) : 2012 Location : EUROPE (Western and Northern)
Price : On request
More detailsTEL Trias Ti/TiN System TEL MF CVD314-02 WAFER SIZE 12 Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Minimum 150 mm Maximum 200 mm Set Size 150 mm Number of Cassette Platforms 24 Rob Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD: MOCVD(SIC)/4in. Year(s) : 2014 Location : South Korea
Price : On request
More detailsCVD: MOCVD/4in Year(s) : 2010 Location : South Korea
Price : On request
More detailsCVD: MOCVD Year(s) : 2004 Location : South Korea
Price : On request
More detailsFeatures: - thin film deposition - encapsulation - coating - eg SiO 2 , SiN x , SiON x , a Si - up to 200 mm w Year(s) : 2015 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD: MOCVD Year(s) : 2006 Location : South Korea
Price : On request
More detailsThe system is configured for analysis and dosing of Dow’s Intervia 8540 Electrolytic Cu plating bath. -20L Res Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCondition Excellent Year of Manufacture 2012 Year(s) : 2012 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 mm Robot Manufacturer/Model Genmark C Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.