Used CVD Equipment
255 resultsWafer Size 200 mm Fab Section Thin Film General Product Information Vendor Supplier Lam Research Model Novell Year(s) : 2000 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Thin Film General Product Information Vendor Supplier AMAT Model Producer SE Vi Year(s) : 2011 Location : United States (USA)
Price : On request
More detailsAPCVD Version: 150 mm Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details200mm, s/n: 97-46-5419 Year(s) : 2000 Location : United States (USA)
Price : On request
More detailsApplied Materials Raider Edge ECD Liftoff Tool 3ea Process Tanks 2ea Chemical Dispense Cabinets HCl, Dilute HF Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVersion: 150 mm Vintage: 01.06.1992 The equipment was operational in the wafer fab up until August 2024. The Year(s) : 1992 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsICP-PECVD deposition system for solar wafers Version: 156 mm square (200 mm) Vintage: 01.06.2015 PECVD deposi Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCVD: MOCVD Location : ASIA (North East)
Price : On request
More detailsWafer Size 300 mm Fab Section Diffusion General Product Information Vendor Supplier APPLIED MATERIALS Model C Year(s) : 2006 Location : United States (USA)
Price : On request
More detailsLarge Area PECVD system, used for SiO and SiN process depositions Version: 150 mm Vintage: 01.06.2015 Plasmat Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCVD: MOCVD/2-4in Year(s) : 2010, 2012 Location : ASIA (North East)
Price : On request
More detailsSPEED, 300mm, s/n: 03-9-C30214 300MM WTS with 2 HDP STI oxide chambers Tool ID: JID1 Year(s) : 2003 Location : United States (USA)
Price : On request
More detailsVertical LPCVD Furnaces Year(s) : 2015 Location : United States (USA)
Price : On request
More detailsChemical Vapor Deposition Equipment Year(s) : 2017 Location : United States (USA)
Price : On request
More details3 Chamber System with 2 Year(s) : 1996 Location : United States (USA)
Price : On request
More detailsTool ID DF-OHT-02 Wafer Size 300 mm Fab Section Diffusion General Product Information Vendor Supplier TEL Mod Year(s) : 2006 Location : United States (USA)
Price : On request
More detailsTool ID DF-PLD-07 Wafer Size 300 mm Fab Section Diffusion General Product Information Vendor Supplier TEL Mod Year(s) : 1999 Location : United States (USA)
Price : On request
More details- Cryo Compressor - Vacuum Pump Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsNOVELLUS, INOVA NEXT, 300mm Tool ID: MDX2951 Year(s) : 2013 Location : EUROPE (Western and Northern)
Price : On request
More detailsPVD cluster tool Version: 150 mm De-installed by the OEM . In working condition. Warehoused. Can be inspected Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVertical Furnace for LPCVD SOD Process Version: 200 mm Vintage: 01.06.2007 Vintage 2007.01 Software OS L Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPVD cluster tool Version: 150 mm Vintage: 01.06.1990 This tool was not operational prior to removal and has m Year(s) : 1990 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsICP PECVD system for solar cells production Version: Solar Vintage: 01.06.2015 -STILL INSTALLED. IN EXCELLENT Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTEL ALPHA-8S-Z, 200mm Tool ID: SOGCU-05 Year(s) : 2002 Location : United States (USA)
Price : On request
More detailsTEL PRECIO NANO WITH SINGLE FOUP LOADER Year(s) : 2002 Location : United States (USA)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.