Used CVD Equipment
263 resultsWafer Size Range Maximum 150 mm Set Size 125 mm Controller Type Microprocessor Controller Type Contr Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsIon implanter Year(s) : 2013 Location : ASIA (North East)
Price : On request
More detailsCVD: APCVD Maker AMAYA Model AEC2250SP-296 Location : ASIA (North East)
Price : On request
More detailsCVD: APCVD Year(s) : 1998 Location : ASIA (North East)
Price : On request
More detailsPVD:Sputter Maker TEAMS CORPORATION Year(s) : 2018 Location : ASIA (North East)
Price : On request
More detailsCVD: APCVD/6in Location : ASIA (North East)
Price : On request
More detailsReticle Handler Model RSR160 Year(s) : 2013 Location : EUROPE (Western and Northern)
Price : On request
More detailsManufacturer Noevllus DKN config Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More details• Process: PECVD iN,SiO2, i-a-Si, SiON and N+ a-Si • SoFware Version: AKT7.3 • System Power RaNng: 208 VAC 3-P Year(s) : 2005 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD Model Vector Express Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsConfiguration: - MAG7 Brooks Robots - MC3 Novellus Module controller - Pfeiffer Turbo and turbo controller - Location : EUROPE (Western and Northern)
Price : On request
More detailsOptical Microscope, 300mm Cold. Not working parts include: Tango Controller (Microscope Stage controller Joy Location : EUROPE (Western and Northern)
Price : On request
More details3 Chambers In Fab, Warm Idle Software version: 2.0405 CIM: E84, SECS-GEM. GEM300, Interface A Hardware Configu Year(s) : 2013 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD/PVD Location : EUROPE (Western and Northern)
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More detailsTool Status: Connected Wafer Size: 300 mm Asset Description: DESPATCH Bake-out Cabinet Oven CIM: NONE Proc Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsDiffusion furnace (OX) Year(s) : 2000 Location : ASIA (North East)
Price : On request
More detailsTrias CVD PECVD-Oxynitride Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer size: 12" Process: Etch OCD Measuring Location : EUROPE (Western and Northern)
Price : On request
More detailsDescription PECVD TEOS with Load Lock Wafer Size Range Maximum 200 mm Process PECVD & TEOS Controller T Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWAFER SIZE 300mm Year(s) : 2009 Location : EUROPE (Western and Northern)
Price : On request
More detailsHigh K Metal CVD and ALD system, NiOx, HfOx process Version: 300 MM Vintage: 01.06.2012 Tokyo Electron Tria Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsEFEM Unit Only Version: 300 mm Vintage: 01.07.2006 DEINSTALLED AND WAREHOUSED CAN BE INSPECTED BY APPOINTMEN Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsThree chamber delta Dhl but is configured for 6 inch (this is not upgradable to 8”). The delta offers two Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer size: 300mm Process: SiCoNi RPS: FI20620-1 x2ea RF Generator: APRX3013 AE Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size 6 Location : ASIA (North East)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.