Used CVD Equipment
254 results3 Chambers In Fab, Warm Idle Software version: 2.0405 CIM: E84, SECS-GEM. GEM300, Interface A Hardware Configu Year(s) : 2013 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD/PVD Location : EUROPE (Western and Northern)
Price : On request
More detailsTool Status: Connected Wafer Size: 300 mm Asset Description: DESPATCH Bake-out Cabinet Oven CIM: NONE Proc Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsCATHODES: 2 magnetron targets 200mm diameter. SUBSTRATE TRANSPORT LOAD LOCK: for 150mm diameter substrates. SU Location : EUROPE (Western and Northern)
Price : On request
More detailsDiffusion furnace (OX) Year(s) : 2000 Location : ASIA (North East)
Price : On request
More detailsTrias CVD PECVD-Oxynitride Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer size: 12" Process: Etch OCD Measuring Location : EUROPE (Western and Northern)
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More detailsDescription PECVD TEOS with Load Lock Wafer Size Range Maximum 200 mm Process PECVD & TEOS Controller T Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFurnace LPCVD-Si3N4 WAFER SIZE 12 Year(s) : 2015 Location : EUROPE (Western and Northern)
Price : On request
More detailsWAFER SIZE 300mm Year(s) : 2009 Location : EUROPE (Western and Northern)
Price : On request
More detailsHigh K Metal CVD and ALD system, NiOx, HfOx process Version: 300 MM Vintage: 01.06.2012 Tokyo Electron Tria Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsEFEM Unit Only Version: 300 mm Vintage: 01.07.2006 DEINSTALLED AND WAREHOUSED CAN BE INSPECTED BY APPOINTMEN Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsThree chamber delta Dhl but is configured for 6 inch (this is not upgradable to 8”). The delta offers two Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer size: 300mm Process: SiCoNi RPS: FI20620-1 x2ea RF Generator: APRX3013 AE Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size 6 Location : ASIA (North East)
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More detailsWafer Size 8 Location : ASIA (North East)
Price : On request
More detailsVacuum System None Vacuum System Chamber made up of the 8" CF 4-way cross, M/N: 600-4T, 304SS 8" CF Door/V Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription In-Line Sputtering System Vacuum System Diffusion Pumped Load Lock Included Yes Power Requireme Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVertical Furnace Oxide Process Version: 200 mm Vintage: 01.08.1999 Comments: 1 Process Oxide 2 Wafer Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDeinstalled, warehoused. 120V 50 HZ SETUP Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details-Double Stack SRD (Set up for solar wafer use) -in excellent , operational condition -Has CE mark -See attache Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPVD:Evaporator Year(s) : 2018 Location : ASIA (North East)
Price : On request
More detailsPVD:Sputter/6in Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD/2in. Year(s) : 2007 Location : ASIA (North East)
Price : On request
More detailsCVD:MOCVD/4in Location : ASIA (North East)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.