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Used CVD Equipment

263 results
1

VTP 1500 LH LPCVD (SiN) Reactor is configured for SiN processing of 200 mm wafers. System is fully automated w Location : AMERICA North (USA-Canada-Mexico)

Price : On request

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1

4504 Four Stack LPCVD Reactor configured for PolySi, Silicon Nitride, SiO2/PSG/BPSG, and TEOS/PTEOS/BPTEOS. Sy Location : AMERICA North (USA-Canada-Mexico)

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1

Wafer size: 300mm Process: CVD Year(s) : 2010 Location : EUROPE (Western and Northern)

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1

CVD Tool with 4 Chambers 2 Chambers Etch, 2 Chambers CVD SILAN Location : EUROPE (Western and Northern)

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1

WAFER SIZE 6 Year(s) : 1995 Location : EUROPE (Western and Northern)

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12

Chemical vapor deposition 2007 or 2008 Evaporation Pyrolyse Tank dia 700 x670 h Pump edwards em80 Year(s) : 2007 Location : EUROPE (Western and Northern)

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1

CVD: MOCVD Year(s) : 2013 Location : ASIA (North East)

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1

Fill Sputter Deposition System Version: 125 mm Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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VDS-5500 Description P-CVD Year(s) : 1988 Location : ASIA (North East)

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Features 2 - 4 channel valve control PCB (for the nupro valves) • 1/8" tubing for the nupro valves (~40 ft) • Location : AMERICA North (USA-Canada-Mexico)

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0

Centura WCVD Location : ASIA (North East)

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VCF-610 Description LP-CVD HTO Year(s) : 1994 Location : ASIA (North East)

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AEC2250 Description AP-CVD(VAPOX) Year(s) : 1985 Location : ASIA (North East)

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Description AP-CVD(AMAX) Location : ASIA (North East)

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Eagle-10 Description P-CVD(E-10) Year(s) : 1994 Location : ASIA (North East)

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MOCVD #5 / LED Year(s) : 2003 Location : ASIA (North East)

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1

K465 Description CVD: MOCVD Year(s) : 2008 Location : ASIA (North East)

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PXJ-200 Year(s) : 1989 Location : ASIA (North East)

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Electroplating Deposition Location : AMERICA North (USA-Canada-Mexico)

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0

Gold Deplater Location : AMERICA North (USA-Canada-Mexico)

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Semitool LT210C Gold Deplater Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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Precision 5000 Mark II Location : AMERICA North (USA-Canada-Mexico)

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1

Photovoltaics diffusion oxidation furnace with 2 oxidation tubes NEW STILL IN ORIGINAL CRATES Location : AMERICA North (USA-Canada-Mexico)

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LPCVD / LED Year(s) : 2008 Location : ASIA (North East)

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1

- Load Locked Chamber - System PC, Keyboard, Mouse - Windows 7 w/ PC4000 Software - 490mm Diameter Aluminum L Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)

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You can find used  CVD Equipment on Wotol

The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson

The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG

HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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