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Used CVD Equipment

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1

APPLIED MATERIALS AMAT CENTURA II consisting of: - 2 DPS / DTM Chambers - Configured for 200mm - Vintage: 2019 Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)

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Applied Materials Raider Edge ECD Liftoff Tool 3ea Process Tanks 2ea Chemical Dispense Cabinets HCl, Dilute HF Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)

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ICP-PECVD deposition system for solar wafers Version: 156 mm square (200 mm) Vintage: 01.06.2015 PECVD deposi Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)

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CVD: MOCVD Location : ASIA (North East)

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Large Area PECVD system, used for SiO and SiN process depositions Version: 150 mm Vintage: 01.06.2015 Plasmat Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)

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CVD: MOCVD/2-4in Year(s) : 2010, 2012 Location : ASIA (North East)

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- Cryo Compressor - Vacuum Pump Location : AMERICA North (USA-Canada-Mexico)

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NOVELLUS, INOVA NEXT, 300mm Tool ID: MDX2951 Year(s) : 2013 Location : EUROPE (Western and Northern)

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PVD cluster tool Version: 150 mm De-installed by the OEM . In working condition. Warehoused. Can be inspected Location : AMERICA North (USA-Canada-Mexico)

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Vertical Furnace for LPCVD SOD Process Version: 200 mm Vintage: 01.06.2007 Vintage 2007.01 Software OS L Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)

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PVD cluster tool Version: 150 mm Vintage: 01.06.1990 This tool was not operational prior to removal and has m Year(s) : 1990 Location : AMERICA North (USA-Canada-Mexico)

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ICP PECVD system for solar cells production Version: Solar Vintage: 01.06.2015 -STILL INSTALLED. IN EXCELLENT Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)

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WAFER SIZE 12 Location : EUROPE (Western and Northern)

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8 inch substrate. Manual load/unload. Vacuum function. Location : AMERICA North (USA-Canada-Mexico)

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Materials Research Corp. 8671 RF Sputtering Vacuum Chamber Location : AMERICA North (USA-Canada-Mexico)

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Sputtering System 2400 – 8L Load Lock Sputter Deposition Coater Comes with AE MDX 1K RF Power Generator Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Maximum 150 mm Set Size 125 mm Controller Type Microprocessor Controller Type Contr Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)

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Ion implanter Year(s) : 2013 Location : ASIA (North East)

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CVD: APCVD Maker AMAYA Model AEC2250SP-296 Location : ASIA (North East)

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CVD: APCVD Year(s) : 1998 Location : ASIA (North East)

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PVD:Sputter Maker TEAMS CORPORATION Year(s) : 2018 Location : ASIA (North East)

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CVD: APCVD/6in Location : ASIA (North East)

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Reticle Handler Model RSR160 Year(s) : 2013 Location : EUROPE (Western and Northern)

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Manufacturer Noevllus DKN config Year(s) : 2008 Location : EUROPE (Western and Northern)

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• Process: PECVD iN,SiO2, i-a-Si, SiON and N+ a-Si • SoFware Version: AKT7.3 • System Power RaNng: 208 VAC 3-P Year(s) : 2005 Location : EUROPE (Western and Northern)

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You can find used  CVD Equipment on Wotol

The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson

The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG

HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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