Used CVD Equipment
263 resultsThe system is configured for analysis and dosing of Dow’s Intervia 8540 Electrolytic Cu plating bath. -20L Res Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCondition Excellent Year of Manufacture 2012 Year(s) : 2012 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 mm Robot Manufacturer/Model Genmark C Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsOXFORD PLASMALAB 100 PECVD consisting of: - Model: Plasmalab 100 PECVD - Process: SiO2 and SiN deposition - Ma Year(s) : 2008 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCVD: MOCVD/4in. Year(s) : 2001 Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD/4in. Year(s) : 2010 Location : ASIA (North East)
Price : On request
More detailsWJ999R with 996-9 Handler Fully Operational With HDD Still installed in FAB Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 mm Number of Cassette Platforms 24 Robot Ma Year(s) : 1999 Location : EUROPE (Western and Northern)
Price : On request
More detailsSystem configured for AsP use Version: 100 mm • E475 Stainless Steel High Efficiency Growth Chamber. Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details4410 sputtering system 3 DELTA TARGETS CTI CRYOPUMP (REBUILT) WITH COMPRESSOR VACUUM VALVES REBUILT NEW HMI/PL Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAPPLIED MATERIALS AMAT CENTURA II consisting of: - 2 DPS / DTM Chambers - Configured for 200mm - Vintage: 2019 Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsApplied Materials Raider Edge ECD Liftoff Tool 3ea Process Tanks 2ea Chemical Dispense Cabinets HCl, Dilute HF Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsICP-PECVD deposition system for solar wafers Version: 156 mm square (200 mm) Vintage: 01.06.2015 PECVD deposi Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCVD: MOCVD Location : ASIA (North East)
Price : On request
More detailsLarge Area PECVD system, used for SiO and SiN process depositions Version: 150 mm Vintage: 01.06.2015 Plasmat Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCVD: MOCVD/2-4in Year(s) : 2010, 2012 Location : ASIA (North East)
Price : On request
More detailsNOVELLUS, INOVA NEXT, 300mm Tool ID: MDX2951 Year(s) : 2013 Location : EUROPE (Western and Northern)
Price : On request
More detailsPVD cluster tool Version: 150 mm De-installed by the OEM . In working condition. Warehoused. Can be inspected Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVertical Furnace for LPCVD SOD Process Version: 200 mm Vintage: 01.06.2007 Vintage 2007.01 Software OS L Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPVD cluster tool Version: 150 mm Vintage: 01.06.1990 This tool was not operational prior to removal and has m Year(s) : 1990 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsICP PECVD system for solar cells production Version: Solar Vintage: 01.06.2015 -STILL INSTALLED. IN EXCELLENT Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWAFER SIZE 12 Location : EUROPE (Western and Northern)
Price : On request
More details8 inch substrate. Manual load/unload. Vacuum function. Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMaterials Research Corp. 8671 RF Sputtering Vacuum Chamber Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSputtering System 2400 – 8L Load Lock Sputter Deposition Coater Comes with AE MDX 1K RF Power Generator Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.